中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor light emitting device and manufacture thereof

文献类型:专利

作者KAWAI YOSHIO; IMANAKA KOUICHI; WATANABE AKIRA; FUKUNAGA TOSHIAKI
发表日期1985-05-27
专利号JP1985094783A
著作权人OKI DENKI KOGYO KK
国家日本
文献子类发明申请
其他题名Semiconductor light emitting device and manufacture thereof
英文摘要PURPOSE:To simplify the structure and to reduce the number of manufacturing steps by narrowing the widths of cap layers of lower side from the cap layer as compared with those of the cap layer, and electrically separating adjacent light emitting elements at the groove therebetween. CONSTITUTION:Light emitting element regions (a), (b), (c) are selectively etched through a V-groove 7 formed on a semiconductor light emitting body 11, and the first clad layer 2, an active layer 3 and the second clad layer 4 measured in the direction parallel to the surface of the substrate and vertical to the light emitting direction are narrowed in width than the cap layer 5. An etchant for etching only one of the two materials is used for the selective etching so that the layer 5 is not etched at the GaAs layer, but the second clad layer 4 is etched at the GaAlAs layer. Further, the layer 3 is of GaAs layer but has extremely reduced thickness, and it is etched together with the first layer 2 made of GaAlAs material, and the overhang 14 of the length (d) is projected at the upper side of the groove 13. Eventually, metal electrode layers 9a, 9b, 9c are adhered to the light emitting regions (a), (b), (c).
公开日期1985-05-27
申请日期1983-10-27
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/89037]  
专题半导体激光器专利数据库
作者单位OKI DENKI KOGYO KK
推荐引用方式
GB/T 7714
KAWAI YOSHIO,IMANAKA KOUICHI,WATANABE AKIRA,et al. Semiconductor light emitting device and manufacture thereof. JP1985094783A. 1985-05-27.

入库方式: OAI收割

来源:西安光学精密机械研究所

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