中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser device

文献类型:专利

作者SEMURA SHIGERU; KURODA TAKARO; OOTA TSUNEAKI; NAKAJIMA HISAO
发表日期1986-10-21
专利号JP1986236186A
著作权人AGENCY OF IND SCIENCE & TECHNOL
国家日本
文献子类发明申请
其他题名Semiconductor laser device
英文摘要PURPOSE:To make the stabilized single mode oscillation possible in the directions both longitudinal and transverse, by constituting a quantum well type structure in both side-domains of a light emitting region installed in the center of the active layer, with a semiconductor of mean composition of two kinds of compound semiconductor, and installing a photo guide layer provided with the diffraction grating on lower surface of the active layer. CONSTITUTION:On the lower clad layer 2 on the substrate 1, the resist is coated and grating pattern is formed by applying the interference of light. By chemical etching, the diffraction grating with the specified period is formed, on which the photo guide 4 is grown, and the thin film of two kinds of compound semiconductor whose forbidden band width is different with each other is laminated to form the quantum well type structure. The upper clad layer 8 and the N-type GaAs layer 9 are grown and formed. The N-type GaAs layer 9 is subjected to the mesa type etching by applying the mask. The P-type impurity is diffused, and the two kinds of semiconductor which constitute the quantum well in the impurity diffusion region 7 of the active layer 5 are alloyed. As compared with the non-diffusion region 6, the forbidden band width is made larger and the refraction index is made smaller. The mask is eliminated, the region 7 is covered with the insulative film 10, the N-side electrode 11 and the P-side electrode 12 are deposited, and the cleavage of both end surfaces is performed.
公开日期1986-10-21
申请日期1985-04-12
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/89533]  
专题半导体激光器专利数据库
作者单位AGENCY OF IND SCIENCE & TECHNOL
推荐引用方式
GB/T 7714
SEMURA SHIGERU,KURODA TAKARO,OOTA TSUNEAKI,et al. Semiconductor laser device. JP1986236186A. 1986-10-21.

入库方式: OAI收割

来源:西安光学精密机械研究所

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