中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor device with epitaxially grown active layer adjacent an optically passive region

文献类型:专利

作者LUKAS CZORNOMAZ; MIRJA RICHTER; HEIKE E. RIEL; JENS HOFRICHTER
发表日期2014-05-07
专利号GB2507513A
著作权人INTERNATIONAL BUSINESS MACHINES CORPORATION
国家英国
文献子类发明申请
其他题名Semiconductor device with epitaxially grown active layer adjacent an optically passive region
英文摘要A semiconductor device 1 comprising an optically passive aspect 2, and an optically active material 6, wherein the optically passive aspect 2 is patterned to comprise a photonic crystal structure 4 with a predefined structure 5, and the optically active material 6 is grown in the predefined structure 5 with a layer 7 acting as a seed layer. Any material which exceeds predefined area 5 may be removed by etching or polishing. The optically active material 6 may be crystalline or amorphous and performs light generation, amplification, detection or modulation. The optically passive region 2 may form a wire waveguide 3. A VCSEL may be formed by the optically active material 6. The cross section of the optically passive region 2 may be smaller than or the same size as that of the predefined structure 5, there may be a tapered region between the optically passive region and the structure 5. The photonic crystal may be a 2D crystal.
公开日期2014-05-07
申请日期2012-10-31
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/93111]  
专题半导体激光器专利数据库
作者单位INTERNATIONAL BUSINESS MACHINES CORPORATION
推荐引用方式
GB/T 7714
LUKAS CZORNOMAZ,MIRJA RICHTER,HEIKE E. RIEL,et al. Semiconductor device with epitaxially grown active layer adjacent an optically passive region. GB2507513A. 2014-05-07.

入库方式: OAI收割

来源:西安光学精密机械研究所

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