Study on the tail in TDOE of the coated MCP-PMT and its suppression
文献类型:会议论文
作者 | Chen, Lin4; Wang, Xingchao2,3![]() ![]() |
出版日期 | 2019 |
会议日期 | 2019-10-22 |
会议地点 | Hangzhou, China |
关键词 | Photomultiplier tube Microchannel plate SEY TDOE |
卷号 | 11184 |
DOI | 10.1117/12.2537851 |
其他题名 | Chen, Lin(1); Wang, Xingchao(2,3); Tian, Jinshou(4); Fan, Lixing(1); Tian, Liping(1); Shen, Lingbin(1) |
英文摘要 | Depositing a high secondary electron yield (SEY) film on the microchannel plate (MCP) input electrode is supposed to be an effective approach to improve the photoelectron collection efficiency (CE) of photomultiplier tubes based on MCPs (MCP-PMTs). Nevertheless, secondaries promoted by the photoelectrons striking the MCP input face may cause a long tail in the time distribution of the output electrons (TDOE). In our work, laying a conductive grid upon the MCPs is proposed as an effective approach to suppress the tail. A three-dimensional MCP-PMT model is developed in CST STUDIO SUITE to systematically investigate the dependence of the TDOE on the applied voltage (U) of the grid at the coated material SEY=6. Simulation results show that high voltage applied on the grid could suppress the delay pulse effectively. The optimal U is above 500 V. © 2019 SPIE. |
产权排序 | 4 |
会议录 | Optoelectronic Devices and Integration VIII
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会议录出版者 | SPIE |
语种 | 英语 |
ISSN号 | 0277786X;1996756X |
WOS记录号 | WOS:000511391200016 |
源URL | [http://ir.opt.ac.cn/handle/181661/93186] ![]() |
专题 | 条纹相机工程中心 |
作者单位 | 1.Key Laboratory of Ultra-fast Photoelectric Diagnostics Technology, Xi'An Institute of Optics and Precision Mechanics (XIOPM), Chinese Academy of Sciences (CAS), Xi'an; 710119, China 2.North Night Vision Technology (NNVT) CO., LTD, Nanjing; 210110, China; 3.School of Electronic Science and Engineering, Southeast University, Nanjing; 210096, China; 4.School of Network and Communication Engineering, Jinling Institute of Technology, Nanjing; 211169, China; |
推荐引用方式 GB/T 7714 | Chen, Lin,Wang, Xingchao,Tian, Jinshou,et al. Study on the tail in TDOE of the coated MCP-PMT and its suppression[C]. 见:. Hangzhou, China. 2019-10-22. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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