Homoepitaxial growth of multiple 4H-SiC wafers assembled in a simple holder via conventional chemical vapor deposition
文献类型:期刊论文
作者 | X.F. Liu ; G.G. Yan ; Z.W. Shen ; Z.X. Wen ; J. Chen ; Y.W. He ; W.S. Zhao ; L. Wang ; M. Guan ; F. Zhang ; G.S. Sun ; Y.P. Zeng |
刊名 | Journal of Crystal Growth |
出版日期 | 2019 |
卷号 | 507页码:283-287 |
源URL | [http://ir.semi.ac.cn/handle/172111/29559] |
专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
推荐引用方式 GB/T 7714 | X.F. Liu ; G.G. Yan ; Z.W. Shen ; Z.X. Wen ; J. Chen ; Y.W. He ; W.S. Zhao ; L. Wang ; M. Guan ; F. Zhang ; G.S. Sun ; Y.P. Zeng ;. Homoepitaxial growth of multiple 4H-SiC wafers assembled in a simple holder via conventional chemical vapor deposition[J]. Journal of Crystal Growth,2019,507:283-287. |
APA | X.F. Liu ; G.G. Yan ; Z.W. Shen ; Z.X. Wen ; J. Chen ; Y.W. He ; W.S. Zhao ; L. Wang ; M. Guan ; F. Zhang ; G.S. Sun ; Y.P. Zeng ;.(2019).Homoepitaxial growth of multiple 4H-SiC wafers assembled in a simple holder via conventional chemical vapor deposition.Journal of Crystal Growth,507,283-287. |
MLA | X.F. Liu ; G.G. Yan ; Z.W. Shen ; Z.X. Wen ; J. Chen ; Y.W. He ; W.S. Zhao ; L. Wang ; M. Guan ; F. Zhang ; G.S. Sun ; Y.P. Zeng ;."Homoepitaxial growth of multiple 4H-SiC wafers assembled in a simple holder via conventional chemical vapor deposition".Journal of Crystal Growth 507(2019):283-287. |
入库方式: OAI收割
来源:半导体研究所
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