Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation
文献类型：期刊论文
| 作者 | Yuancheng Wang; Hongwei Qu; Yufei Wang; Fengxin Dong; Zhonghao Chen; Wanhua Zheng |
| 刊名 | ACS Omega
 |
| 出版日期 | 2019 |
| 卷号 | 4期号:23页码:20205-20211 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/29808]  |
| 专题 | 半导体研究所_固态光电信息技术实验室 |
| 推荐引用方式 GB/T 7714 | Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng. Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation[J]. ACS Omega,2019,4(23):20205-20211. |
| APA | Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng.(2019).Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation.ACS Omega,4(23),20205-20211. |
| MLA | Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng."Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation".ACS Omega 4.23(2019):20205-20211. |
入库方式： OAI收割
来源：半导体研究所
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