中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet

文献类型:期刊论文

作者Hisashi Nakahiro1; Peng Zhao3,4; Akihisa Ogino1,4; Wei Zheng2; Yuedong Meng3; Masaaki Nagatsu1,4
刊名Applied Physics Express
出版日期2012
源URL[http://ir.hfcas.ac.cn:8080/handle/334002/43296]  
专题合肥物质科学研究院_中科院等离子体物理研究所
作者单位1.Graduate School of Engineering, Shizuoka University, Hamamatsu 432-8561, Japan
2.Research and Technology Center, Yazaki Corporation, Susono, Shizuoka 410-1194, Japan
3.3Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, Hefei 230031, P. R. China
4.Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan
推荐引用方式
GB/T 7714
Hisashi Nakahiro,Peng Zhao,Akihisa Ogino,et al. Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet[J]. Applied Physics Express,2012.
APA Hisashi Nakahiro,Peng Zhao,Akihisa Ogino,Wei Zheng,Yuedong Meng,&Masaaki Nagatsu.(2012).Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet.Applied Physics Express.
MLA Hisashi Nakahiro,et al."Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet".Applied Physics Express (2012).

入库方式: OAI收割

来源:合肥物质科学研究院

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