Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet
文献类型：期刊论文
| 作者 | Hisashi Nakahiro1; Peng Zhao3,4 ; Akihisa Ogino1,4; Wei Zheng2; Yuedong Meng3; Masaaki Nagatsu1,4
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| 刊名 | Applied Physics Express
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| 出版日期 | 2012 |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/43296]  |
| 专题 | 合肥物质科学研究院_中科院等离子体物理研究所 |
| 作者单位 | 1.Graduate School of Engineering, Shizuoka University, Hamamatsu 432-8561, Japan 2.Research and Technology Center, Yazaki Corporation, Susono, Shizuoka 410-1194, Japan 3.3Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, Hefei 230031, P. R. China 4.Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan |
| 推荐引用方式 GB/T 7714 | Hisashi Nakahiro,Peng Zhao,Akihisa Ogino,et al. Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet[J]. Applied Physics Express,2012. |
| APA | Hisashi Nakahiro,Peng Zhao,Akihisa Ogino,Wei Zheng,Yuedong Meng,&Masaaki Nagatsu.(2012).Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet.Applied Physics Express. |
| MLA | Hisashi Nakahiro,et al."Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet".Applied Physics Express (2012). |
入库方式： OAI收割
来源：合肥物质科学研究院
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