Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor
文献类型：期刊论文
| 作者 | Wang, Li2; Deng, LunHua2; Li, Bao2; Fang, Bo1; Zhao, WeiXiong1 ; Xu, HuaiLiang2,3
|
| 刊名 | PHYSICS OF PLASMAS
 |
| 出版日期 | 2020-06-01 |
| 卷号 | 27 |
| ISSN号 | 1070-664X |
| DOI | 10.1063/5.0006191 |
| 通讯作者 | Deng, LunHua(lhdeng@phy.ecnu.edu.cn) |
| 英文摘要 | Hydroxyl (OH) radicals were generated by dielectric barrier discharge (DBD) from water vapor in a multi-pass cell with a volume of 8000cm(3). The cell was filled with the following water vapor at reduced pressure. The absolute OH number density was accurately determined by direct absorption spectroscopy using a tunable laser operating at 2.8 mu m. The absolute OH number density was around 10(12) molecules/cm(3). Helium, methane, ethane, propane, and carbon monoxide were respectively introduced into the multi-pass cell to study their influences on the OH number density. The decay rate of OH number density was directly related to the reaction rates of the added gases. The low-pressure DBD OH multi-pass cell can be used as a reactor to further study the reaction kinetics associated with OH radicals. |
| WOS关键词 | LASER-INDUCED FLUORESCENCE ; HYDROXYL RADICALS ; SPECTROSCOPY ; PHOTOPRODUCTION ; SYSTEM |
| 资助项目 | National Natural Science Foundation of China (NSFC)[61625501] ; National Natural Science Foundation of China (NSFC)[61427816] ; Open Fund of the State Key Laboratory of High Field Laser Physics (SIOM) ; Open Fund of the State Key Laboratory of Precision Spectroscopy |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000538130300001 |
| 出版者 | AMER INST PHYSICS |
| 资助机构 | National Natural Science Foundation of China (NSFC) ; Open Fund of the State Key Laboratory of High Field Laser Physics (SIOM) ; Open Fund of the State Key Laboratory of Precision Spectroscopy |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/103065]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 通讯作者 | Deng, LunHua |
| 作者单位 | 1.Chinese Acad Sci, Anhui Inst Opt & Fine Mech, Lab Atmospher Phys Chem, Hefei 230031, Anhui, Peoples R China 2.East China Normal Univ, State Key Lab Precis Spect, 3663 Zhongshan Rd N, Shanghai 200062, Peoples R China 3.Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Li,Deng, LunHua,Li, Bao,et al. Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor[J]. PHYSICS OF PLASMAS,2020,27. |
| APA | Wang, Li,Deng, LunHua,Li, Bao,Fang, Bo,Zhao, WeiXiong,&Xu, HuaiLiang.(2020).Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor.PHYSICS OF PLASMAS,27. |
| MLA | Wang, Li,et al."Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor".PHYSICS OF PLASMAS 27(2020). |
入库方式： OAI收割
来源：合肥物质科学研究院
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