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Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes

文献类型：期刊论文

作者Yip, Chi-Shung2; Jin, Chenyao2; Zhang, Wei2; Xu, Guo Sheng2; Hershkowitz, Noah1
刊名PLASMA SOURCES SCIENCE & TECHNOLOGY
出版日期2020-02-01
卷号29
关键词sheaths plasma diagnostics electron emission basic plasma physics
ISSN号0963-0252
DOI10.1088/1361-6595/ab60dd
通讯作者Zhang, Wei(zhangwei@ipp.ac.cn) ; Xu, Guo Sheng(gsxu@ipp.ac.cn)
英文摘要I-V traces of strongly emitting emissive probes are investigated in a multidiople filament discharge. It is found that at sufficiently high neutral pressure and emitting current, the variation of the I-V traces and their associated inflection points no longer follow the previous predictions of space charge limited (SCL) models. A new, steep slope region of the I-V trace appears near the plasma potential when the probe is strongly emitting, causing the inflection point and the floating potential to increase towards the plasma potential as emission current increases, rather than staying constant. This is, to our knowledge, the first experimental evidence that the effects predicted by Campanell et al's inverse sheath theory (2017 Physics of Plasmas 24 057101) not only affect the floating potential but also a region in the I-V trace of an emissive probe. It is also found that the double inflection point structure when the probe is biased below the ionization energy of the working gas is highly likely to be an emission retardation effect from enhanced virtual cathode formation due to the increased local electron density. The implications of these findings on hot cathode sources are briefly discussed.
WOS关键词EDGE
资助项目Chinese Academy of Science Hundred Youth Talent Program ; CAS Key Research Program of Frontier Sciences grant[QYZDB-SSW-SLH001] ; National Natural Science Foundation of China[11875285] ; National Natural Science Foundation of China[11575248] ; National Natural Science Foundation of China[11505220] ; US National Science Foundation[1804654]
WOS研究方向Physics
语种英语
WOS记录号WOS:000537715000001
出版者IOP PUBLISHING LTD
资助机构Chinese Academy of Science Hundred Youth Talent Program ; CAS Key Research Program of Frontier Sciences grant ; National Natural Science Foundation of China ; US National Science Foundation
源URL[http://ir.hfcas.ac.cn:8080/handle/334002/103069]  
专题中国科学院合肥物质科学研究院
通讯作者Zhang, Wei; Xu, Guo Sheng
作者单位1.Univ Wisconsin, Dept Engn Phys, Madison, WI 53706 USA
2.Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China
推荐引用方式
GB/T 7714		 Yip, Chi-Shung,Jin, Chenyao,Zhang, Wei,et al. Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY,2020,29.
APA Yip, Chi-Shung,Jin, Chenyao,Zhang, Wei,Xu, Guo Sheng,&Hershkowitz, Noah.(2020).Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes.PLASMA SOURCES SCIENCE & TECHNOLOGY,29.
MLA Yip, Chi-Shung,et al."Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes".PLASMA SOURCES SCIENCE & TECHNOLOGY 29(2020).

入库方式： OAI收割

来源：合肥物质科学研究院

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