Investigation on the influence of the gas flow mode around substrate on the deposition of diamond films in an overmoded MPCVD reactor chamber
文献类型：期刊论文
| 作者 | Wang, B.2; Weng, J.2; Wang, Z. T.2; Wang, J. H.1,2; Liu, F.2 ; Xiong, L. W.2
|
| 刊名 | VACUUM
 |
| 出版日期 | 2020-12-01 |
| 卷号 | 182 |
| 关键词 | Gas flow mode Diamond films Uniformity Microwave plasma Chemical vapor deposition |
| ISSN号 | 0042-207X |
| DOI | 10.1016/j.vacuum.2020.109659 |
| 通讯作者 | Weng, J.(14101201@wit.edu.cn) |
| 英文摘要 | In an overmoded home-made MPCVD reactor, the influence of gas flow mode on the deposition of diamond films was investigated with H2/CH4 gas mixtures at the microwave power of 5800 W. The simulation results show that the diamond films can be grown in the environment filled with the gas mixture with relative high gas flow rate when an improved gas flow mode is established around the substrate. The scanning electron microscope and Raman spectra indicate that the improved gas flow mode plays a role in the growth of well-faceted crystals at the edge area of the diamond films. The quality, growth rate and uniformity of the diamond films can be significantly improved when introducing the improved gas flow mode. To explain the experimental results, the plasma is measured by optical emission spectrometer. It is shown that in the improved gas flow mode, the activated species of C-2 and H in the plasma exhibit a uniform distribution. Furthermore the improved gas flow mode enlarges the area of the region where the concentrations of activated C-2 and H are coupled. The diamond films with 50.8 mm and 101.6 mm in diameter have been finally deposited in the improved gas flow mode. |
| WOS关键词 | MICROWAVE PLASMA CVD ; CHEMICAL-VAPOR-DEPOSITION ; SINGLE-CRYSTAL DIAMOND ; LARGE-AREA DEPOSITION ; THIN-FILMS ; QUALITY ; GROWTH ; COATINGS ; NITROGEN ; POWER |
| 资助项目 | Natural Science Foundation of China[51402220] ; Research Fund of Wuhan Institute of Technology[K201506] |
| WOS研究方向 | Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000582757100008 |
| 出版者 | PERGAMON-ELSEVIER SCIENCE LTD |
| 资助机构 | Natural Science Foundation of China ; Research Fund of Wuhan Institute of Technology |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/104854]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 通讯作者 | Weng, J. |
| 作者单位 | 1.Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China 2.Wuhan Inst Technol, Key Lab Plasma Chem & Adv Mat Hubei Prov, Wuhan 430205, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, B.,Weng, J.,Wang, Z. T.,et al. Investigation on the influence of the gas flow mode around substrate on the deposition of diamond films in an overmoded MPCVD reactor chamber[J]. VACUUM,2020,182. |
| APA | Wang, B.,Weng, J.,Wang, Z. T.,Wang, J. H.,Liu, F.,&Xiong, L. W..(2020).Investigation on the influence of the gas flow mode around substrate on the deposition of diamond films in an overmoded MPCVD reactor chamber.VACUUM,182. |
| MLA | Wang, B.,et al."Investigation on the influence of the gas flow mode around substrate on the deposition of diamond films in an overmoded MPCVD reactor chamber".VACUUM 182(2020). |
入库方式： OAI收割
来源：合肥物质科学研究院
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