Direct Regulation of O/W Stoichiometric Ratio and Microstructure in Tungsten Oxide Electrochromic Films by Ar Pressure Using Oxide Target Sputtering
文献类型：期刊论文
| 作者 | Zhao, Wenkai; Zhao, Yue; Yang, Ye; Li, Jia; Lan, Pinjun; Huang, Jinhua; Song, Weijie |
| 刊名 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
 |
| 出版日期 | 2020 |
| 卷号 | 217期号:8 |
| 关键词 | THIN-FILMS PERFORMANCE DEGRADATION DEPOSITION DYNAMICS DEVICE |
| DOI | 10.1002/pssa.201900999 |
| 英文摘要 | Herein, amorphous tungsten oxide electrochromic (EC) films are successfully prepared by radiofrequency (RF) magnetron sputtering in pure Ar atmosphere using an oxide target. The effect of Ar pressure on the apparent color, deposition rate, crystal structure, O/W ratio, surface morphology, and EC properties of the as-deposited tungsten oxide films is systematically investigated using spectroscopic ellipsometry, X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscopy, and cyclic voltammetry. Interestingly, the Ar gas pressure plays a key role in regulating the O/W ratio, microstructure, and EC properties of the obtained tungsten oxide films. The films are all substoichiometric, and the O/W ratio changes from 2.79 to 2.89 with the increase in Ar pressure. In addition, the loose surface microstructure is shown as Ar pressure increases. The tungsten oxide films deposited at the Ar gas pressure of 1.2 Pa reaches the deposition rate of 13.0 nm min(-1), the largest optical modulation of 71.2% at 550 nm, and the EC efficiency of 51.3 cm(2) C-1. This film also reveals excellent electrochemical stability and sustains more than 200 cycles. These results provide a simple solution for preparing high-quality tungsten oxide EC films using oxide ceramic targets in pure Ar atmosphere. |
| 学科主题 | Materials Science ; Physics |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/19819]  |
| 专题 | 2020专题 2020专题_期刊论文 |
| 作者单位 | 1.Yang, Y 2.Song, WJ (corresponding author), Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Peoples R China. 3.Song, WJ (corresponding author), Jiangsu Collaborat Innovat Ctr Photovolta Sci & E, Lab PV Mat & Devices, Changzhou 213164, Peoples R China. |
| 推荐引用方式 GB/T 7714 | Zhao, Wenkai,Zhao, Yue,Yang, Ye,et al. Direct Regulation of O/W Stoichiometric Ratio and Microstructure in Tungsten Oxide Electrochromic Films by Ar Pressure Using Oxide Target Sputtering[J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE,2020,217(8). |
| APA | Zhao, Wenkai.,Zhao, Yue.,Yang, Ye.,Li, Jia.,Lan, Pinjun.,...&Song, Weijie.(2020).Direct Regulation of O/W Stoichiometric Ratio and Microstructure in Tungsten Oxide Electrochromic Films by Ar Pressure Using Oxide Target Sputtering.PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE,217(8). |
| MLA | Zhao, Wenkai,et al."Direct Regulation of O/W Stoichiometric Ratio and Microstructure in Tungsten Oxide Electrochromic Films by Ar Pressure Using Oxide Target Sputtering".PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 217.8(2020). |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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