Detecting band profiles of devices with conductive atomic force microscopy
文献类型：期刊论文
| 作者 | Li, RR; Taniguchi, T; Watanabe, K; Xue, JM |
| 刊名 | REVIEW OF SCIENTIFIC INSTRUMENTS
 |
| 出版日期 | 2020-07-01 |
| 期号 | 7 |
| ISSN号 | 0034-6748 |
| DOI | 10.1063/5.0008412 |
| 文献子类 | Article |
| 英文摘要 | Band profiles of electronic devices are of fundamental importance in determining their properties. A technique that can map the band profile of both the interior and edges of a device at the nanometer scale is highly demanded. Conventional scanning tunneling spectroscopy (STS) can map band structure at the atomic scale but is limited to the interior of large and conductive samples. Here, we develop contact-mode STS based on a conductive atomic force microscope that can remove these constraints. With this technique, we map the band profile of MoS2 transistors with nanometer resolution at room temperature. A band bending of 0.6 eV within 18 nm of the edges of MoS2 on an insulating substrate is discovered. This technique will be of great use for both fundamental and applied studies of various electronic devices. |
| WOS关键词 | MOS2 TRANSISTORS ; EDGE STATES ; GAP |
| WOS研究方向 | Instruments & Instrumentation ; Physics |
| 语种 | 英语 |
| 出版者 | AMER INST PHYSICS |
| 源URL | [http://ir.sic.ac.cn/handle/331005/27924]  |
| 专题 | 中国科学院上海硅酸盐研究所 |
| 推荐引用方式 GB/T 7714 | Li, RR,Taniguchi, T,Watanabe, K,et al. Detecting band profiles of devices with conductive atomic force microscopy[J]. REVIEW OF SCIENTIFIC INSTRUMENTS,2020(7). |
| APA | Li, RR,Taniguchi, T,Watanabe, K,&Xue, JM.(2020).Detecting band profiles of devices with conductive atomic force microscopy.REVIEW OF SCIENTIFIC INSTRUMENTS(7). |
| MLA | Li, RR,et al."Detecting band profiles of devices with conductive atomic force microscopy".REVIEW OF SCIENTIFIC INSTRUMENTS .7(2020). |
入库方式： OAI收割
来源：上海硅酸盐研究所
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