Doubled Thermoelectric Figure of Merit in p-Type beta-FeSi2 via Synergistically Optimizing Electrical and Thermal Transports
文献类型：期刊论文
| 作者 | Du, XL; Qiu, PF; Chai, J; Mao, T; Hu, P; Yang, J; Sun, YY; Shi, X; Chen, LD |
| 刊名 | ACS APPLIED MATERIALS & INTERFACES
 |
| 出版日期 | 2020-03-18 |
| 期号 | 11页码:12901 |
| ISSN号 | 1944-8244 |
| DOI | 10.1021/acsami.0c00321 |
| 文献子类 | Article |
| 英文摘要 | beta-FeSi2 has long been investigated as a promising thermoelectric (TE) material working at high temperatures due to its combining features of environmental friendliness, good thermal stability, and strong oxidation resistance. However, the real application of beta-FeSi2 is still limited by its low TE figure of merit (zT). In this study, nearly doubled zT in p-type beta-FeSi2 has been achieved via synergistically optimizing electrical and thermal transports. Based on the first-principles calculations, AI with shallow acceptor transition level and high carrier donation efficiency is chosen to dope beta-FeSi2. Significantly improved electrical transport, particularly in the low temperature range, has been obtained in the AI-doped beta-FeSi2 system. The power factor for FeSi1.96Al0.04 at 300 K is even higher than that of p-type beta-FeSi2 based compounds reported previously at high temperatures. By alloying beta-FeSi2 with Os at the Fe sites, we further lower the lattice thermal conductivity. Fe0.80Os0.20Si1.96Al0.04 possesses the lowest lattice thermal conductivity among the beta-FeSi2 compounds prepared by the equilibrium method. Finally, a record-high zT value of 0.35 is obtained for p-type Fe0.80Os0.20Si1.96Al0.04. This study is expected to accelerate the application of beta-FeSi2. |
| WOS关键词 | IRON DISILICIDE ; POWER-GENERATION ; PERFORMANCE ; AL ; FESI2 ; MN ; MICROSTRUCTURES ; SOLIDIFICATION ; CONDUCTIVITY ; ALLOYS |
| WOS研究方向 | Science & Technology - Other Topics ; Materials Science |
| 语种 | 英语 |
| 出版者 | AMER CHEMICAL SOC |
| 源URL | [http://ir.sic.ac.cn/handle/331005/28222]  |
| 专题 | 中国科学院上海硅酸盐研究所 |
| 推荐引用方式 GB/T 7714 | Du, XL,Qiu, PF,Chai, J,et al. Doubled Thermoelectric Figure of Merit in p-Type beta-FeSi2 via Synergistically Optimizing Electrical and Thermal Transports[J]. ACS APPLIED MATERIALS & INTERFACES,2020(11):12901. |
| APA | Du, XL.,Qiu, PF.,Chai, J.,Mao, T.,Hu, P.,...&Chen, LD.(2020).Doubled Thermoelectric Figure of Merit in p-Type beta-FeSi2 via Synergistically Optimizing Electrical and Thermal Transports.ACS APPLIED MATERIALS & INTERFACES(11),12901. |
| MLA | Du, XL,et al."Doubled Thermoelectric Figure of Merit in p-Type beta-FeSi2 via Synergistically Optimizing Electrical and Thermal Transports".ACS APPLIED MATERIALS & INTERFACES .11(2020):12901. |
入库方式： OAI收割
来源：上海硅酸盐研究所
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