中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations

文献类型:期刊论文

作者Naifeng Li3; Yue Wang3; Haifeng Sun1; Junjie Hu3; Maoyuan Zheng3; Sihao Ye3; Qi Wang3; Yingtao Li3; Deyan He3; Jiatai Wang4
刊名Applied Physics Letters
出版日期2020
卷号6期号:16页码:063503
语种英语
源URL[http://ir.licp.cn/handle/362003/26877]  
专题兰州化学物理研究所_固体润滑国家重点实验室
通讯作者Jing Qi
作者单位1.Western Theater Army
2.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemicals Physics, Chinese Academy of Sciences
3.Key Laboratory of Special Function Materials and Structure Design, Ministry of Education, School of Physical Science and Technology, Lanzhou University
4.School of Physics and Electronic Information Engineering, Qinghai Normal University
推荐引用方式
GB/T 7714
Naifeng Li,Yue Wang,Haifeng Sun,et al. Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations[J]. Applied Physics Letters,2020,6(16):063503.
APA Naifeng Li.,Yue Wang.,Haifeng Sun.,Junjie Hu.,Maoyuan Zheng.,...&Jing Qi.(2020).Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations.Applied Physics Letters,6(16),063503.
MLA Naifeng Li,et al."Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations".Applied Physics Letters 6.16(2020):063503.

入库方式: OAI收割

来源:兰州化学物理研究所

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