Impact of mask absorber thickness on the focus shift effect in extreme ultraviolet lithography
文献类型：期刊论文
| 作者 | Cao, YT (Cao, Yuting) ; Wang, XZ (Wang, Xiangzhao) ; Tu, YY (Tu, Yuanying) ; Bu, P (Bu, Peng) |
| 刊名 | journal of vacuum science & technology b
 |
| 出版日期 | 2012 |
| 卷号 | 30期号:3 |
| WOS记录号 | WOS:000305042000026 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/11330]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Cao, YT ,Wang, XZ ,Tu, YY ,et al. Impact of mask absorber thickness on the focus shift effect in extreme ultraviolet lithography[J]. journal of vacuum science & technology b,2012,30(3). |
| APA | Cao, YT ,Wang, XZ ,Tu, YY ,&Bu, P .(2012).Impact of mask absorber thickness on the focus shift effect in extreme ultraviolet lithography.journal of vacuum science & technology b,30(3). |
| MLA | Cao, YT ,et al."Impact of mask absorber thickness on the focus shift effect in extreme ultraviolet lithography".journal of vacuum science & technology b 30.3(2012). |
入库方式： OAI收割
来源：上海光学精密机械研究所
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