Synthesis of Si/SiO2 core–shell nanowire arrays and broadband anti-reflection effects in diluted Si nanowire arrays by adjusting dielectric shell thickness
文献类型：期刊论文
| 作者 | Li,Xinhua1; Chen,Tao1; Zhou,BuKang1; Liu,Guangqiang1; Shi,Tongfei1 ; Wen,Long2; Cao,Huaxiang1; Wang,Yuqi1
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| 刊名 | Nanotechnology
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| 出版日期 | 2017-04-07 |
| 卷号 | 28 |
| 关键词 | nanowire nanosphere lithography (NSL) finite-difference time-domain (FDTD) |
| ISSN号 | 0957-4484 |
| DOI | 10.1088/1361-6528/aa66b4 |
| 英文摘要 | Abstract A low filling ratio and enhanced absorption is needed to enable the full potential of Si nanowire (NW) arrays for optoelectronic applications. In this paper, we report a versatile, scalable fabrication technique that uses nanosphere lithography (NSL) patterning for the synthesis of vertically aligned Si and Si/SiO2 NW arrays. The optical reflection of the NW arrays can be substantially suppressed by the addition of the transparent shell. Meanwhile, by the finite-difference time-domain (FDTD) simulation, we find that the absorption enhancement in the core Si NW can be obtained by adding the transparent shell. The special absorption enhancement of the Si NW arrays with a core–shell structure can be theoretically understood by modal analysis. The absorption in such Si NW array structures is very sensitive to the thickness of transparent coating. By the addition of a SiO2 shell layer, the absorption in the inner Si NW array can be substantially enhanced. Furthermore, significant absorption enhancement and broadband anti-reflection effects can be achieved by the diluted Si NWs combined with the single dielectric shell. |
| 语种 | 英语 |
| WOS记录号 | IOP:0957-4484-28-18-AA66B4 |
| 出版者 | IOP Publishing |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/42956]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 作者单位 | 1.Key Laboratory of Material Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China 2.Key Lab of Nanodevices and Applications-CAS & Collaborative Innovation Center of Suzhou Nano Science and Technology, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, People’s Republic of China |
| 推荐引用方式 GB/T 7714 | Li,Xinhua,Chen,Tao,Zhou,BuKang,et al. Synthesis of Si/SiO2 core–shell nanowire arrays and broadband anti-reflection effects in diluted Si nanowire arrays by adjusting dielectric shell thickness[J]. Nanotechnology,2017,28. |
| APA | Li,Xinhua.,Chen,Tao.,Zhou,BuKang.,Liu,Guangqiang.,Shi,Tongfei.,...&Wang,Yuqi.(2017).Synthesis of Si/SiO2 core–shell nanowire arrays and broadband anti-reflection effects in diluted Si nanowire arrays by adjusting dielectric shell thickness.Nanotechnology,28. |
| MLA | Li,Xinhua,et al."Synthesis of Si/SiO2 core–shell nanowire arrays and broadband anti-reflection effects in diluted Si nanowire arrays by adjusting dielectric shell thickness".Nanotechnology 28(2017). |
入库方式： OAI收割
来源：合肥物质科学研究院
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