In vitro antimicrobial effects and mechanism of atmospheric-pressure He/O2 plasma jet on Staphylococcus aureus biofilm
文献类型：期刊论文
| 作者 | Xu,Zimu1; Shen,Jie2 ; Cheng,Cheng2,3; Hu,Shuheng1; Lan,Yan2; Chu,Paul K4
|
| 刊名 | Journal of Physics D: Applied Physics
 |
| 出版日期 | 2017-02-09 |
| 卷号 | 50 |
| 关键词 | atmospheric-pressure plasma jet (APPJ) Staphylococcus aureus biofilm inactivation reactive oxygen species (ROS) |
| ISSN号 | 0022-3727 |
| DOI | 10.1088/1361-6463/aa593f |
| 英文摘要 | Abstract The antimicrobial effects and associated mechanism of inactivation of Staphylococcus aureus (S. aureus) NCTC-8325 biofilms induced by a He/O2 atmospheric-pressure plasma jet (APPJ) are investigated in vitro. According to CFU (colony forming units) counting and the resazurin-based assay, the 10?min He/O2 (0.5%) APPJ treatment produces the optimal inactivation efficacy (>5 log10?ml?1) against the S. aureus biofilm and 5% of the bacteria enter a viable but non-culturable (VBNC) state. Meanwhile, 94% of the bacteria suffer from membrane damage according to SYTO 9/PI counterstaining. Scanning electron microscopy (SEM) reveals that plasma exposure erodes the extracellular polymeric substances (EPS) and then the cellular structure. The H2DCFDA-stained biofilms show larger concentrations of intracellular reactive oxygen species (ROS) in membrane-intact bacteria with increasing plasma dose. The admixture of oxygen in the working gas highly contributes to the deactivation efficacy of the APPJ against S. aureus and the plasma-induced endogenous ROS may work together with the discharge-generated ROS to continuously damage the bacterial membrane structure leading to deactivation of the biofilm microbes. |
| 语种 | 英语 |
| WOS记录号 | IOP:0022-3727-50-10-AA593F |
| 出版者 | IOP Publishing |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/42818]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 作者单位 | 1.School of Resources and Environmental Engineering, Hefei University of Technology, Hefei, Anhui Province 230009, People’s Republic of China 2.Institute of Plasma Physics, Chinese Academy of Sciences, PO Box 1126, Hefei 230031, People’s Republic of China 3.Center of Medical Physics and Technology, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China 4.Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, People’s Republic of China |
| 推荐引用方式 GB/T 7714 | Xu,Zimu,Shen,Jie,Cheng,Cheng,et al. In vitro antimicrobial effects and mechanism of atmospheric-pressure He/O2 plasma jet on Staphylococcus aureus biofilm[J]. Journal of Physics D: Applied Physics,2017,50. |
| APA | Xu,Zimu,Shen,Jie,Cheng,Cheng,Hu,Shuheng,Lan,Yan,&Chu,Paul K.(2017).In vitro antimicrobial effects and mechanism of atmospheric-pressure He/O2 plasma jet on Staphylococcus aureus biofilm.Journal of Physics D: Applied Physics,50. |
| MLA | Xu,Zimu,et al."In vitro antimicrobial effects and mechanism of atmospheric-pressure He/O2 plasma jet on Staphylococcus aureus biofilm".Journal of Physics D: Applied Physics 50(2017). |
入库方式： OAI收割
来源：合肥物质科学研究院
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