中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effects of annealing on the interfacial properties and energy-band alignment of AlN dielectric on 4H–SiC

文献类型:期刊论文

作者Zhanwei Shen;   Feng Zhang;   Jun Chen;   Zhao Fu;   Xingfang Liu;   Guoguo Yan;   Bowen Lv;   Yinshu Wang;   Lei Wang;  Wanshun Zhao;   Guosheng Sun;   Yiping Zeng
刊名APPLIED PHYSICS LETTERS
出版日期2020
卷号117期号:10页码:102105
源URL[http://ir.semi.ac.cn/handle/172111/30126]  
专题半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式
GB/T 7714
Zhanwei Shen; Feng Zhang; Jun Chen; Zhao Fu; Xingfang Liu; Guoguo Yan; Bowen Lv; Yinshu Wang; Lei Wang;Wanshun Zhao; Guosheng Sun; Yiping Zeng. Effects of annealing on the interfacial properties and energy-band alignment of AlN dielectric on 4H–SiC[J]. APPLIED PHYSICS LETTERS,2020,117(10):102105.
APA Zhanwei Shen; Feng Zhang; Jun Chen; Zhao Fu; Xingfang Liu; Guoguo Yan; Bowen Lv; Yinshu Wang; Lei Wang;Wanshun Zhao; Guosheng Sun; Yiping Zeng.(2020).Effects of annealing on the interfacial properties and energy-band alignment of AlN dielectric on 4H–SiC.APPLIED PHYSICS LETTERS,117(10),102105.
MLA Zhanwei Shen; Feng Zhang; Jun Chen; Zhao Fu; Xingfang Liu; Guoguo Yan; Bowen Lv; Yinshu Wang; Lei Wang;Wanshun Zhao; Guosheng Sun; Yiping Zeng."Effects of annealing on the interfacial properties and energy-band alignment of AlN dielectric on 4H–SiC".APPLIED PHYSICS LETTERS 117.10(2020):102105.

入库方式: OAI收割

来源:半导体研究所

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