Sub-aperture optical system testing by using of a modified simulateous fit method
文献类型:会议论文
作者 | Kewei, E.; Zhao, Jianke![]() ![]() ![]() ![]() |
出版日期 | 2020 |
会议日期 | 2020-06-29 |
会议地点 | Shanghai, China |
关键词 | wavefront testing sub-aperture stitching large aperture optical system simultaneous fit |
卷号 | 11568 |
DOI | 10.1117/12.2579949 |
英文摘要 | Sub-aperture stitching interferometry can be used for measurement of wavefront of large aperture optical system. A variety of sub-aperture stitching algorithms have been studied to reconstruct the sub-aperture data to obtain full aperture wavefront. The simultaneous fitting method plays an important role among those stitching algorithms which uses a series of global polynomials to accomplish the fitting of the test wavefronts, however, it can only be applied in the case of there have no overlap between each sub-apertures. Therefore, a modified simultaneous fitting method is proposed and is applied to measure the wavefront of large aperture optical system. The proposed algorithm is applicable whether there exists overlap between each sub-aperture or not. The numerical simulation is carried out to evaluate the accuracy of the algorithm. Further, a practical stitching experiment that test an optical system with a diameter of 850mm was implemented to demonstrate the modified algorithm. © 2020 SPIE. All rights reserved. |
产权排序 | 1 |
会议录 | AOPC 2020: Optics Ultra Precision Manufacturing and Testing
![]() |
会议录出版者 | SPIE |
语种 | 英语 |
ISSN号 | 0277786X;1996756X |
ISBN号 | 9781510639577 |
WOS记录号 | WOS:000616198900047 |
源URL | [http://ir.opt.ac.cn/handle/181661/94436] ![]() |
专题 | 西安光学精密机械研究所_检测技术研究中心 |
通讯作者 | Kewei, E. |
作者单位 | Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an; 10119, China |
推荐引用方式 GB/T 7714 | Kewei, E.,Zhao, Jianke,Wang, Tao,et al. Sub-aperture optical system testing by using of a modified simulateous fit method[C]. 见:. Shanghai, China. 2020-06-29. |
入库方式: OAI收割
来源:西安光学精密机械研究所
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。