Fabrication and damage characteristics of low stress HR films for femtosecond laser system
文献类型：会议论文
| 作者 | Long, Guoyun1,2; Zhang, Yaoping1 |
| 出版日期 | 2019 |
| 会议日期 | November 26, 2018 - November 28, 2018 |
| 会议地点 | Hefei, China |
| 关键词 | Low stress femtosecond Laser damage |
| 卷号 | 11068 |
| DOI | 10.1117/12.2524519 |
| 页码 | 110681F |
| 英文摘要 | With the development of femtosecond laser system, the laser damage threshold of optical components becomes more important. Meanwhile, in order to obtain better laser beam quality and avoid wavefront distortion caused by optical components, more stringent requirements are put forward for the surface shape of the coated surface of mirrors. HfO2-SiO2 high reflective films were fabricated by e-beam thermal evaporation method. Internal stress of the multilayer dielectrics was modulated by changing the design of films and coating process. Finally, the film with an absolute internal stress less than 100MPa was obtained. The laser damage characteristics of the films at 35fs, 1000Hz were studied, and the damage mechanism was analyzed. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only. |
| 会议录 | Proceedings of SPIE 11068 - Second Symposium on Novel Technology of X-Ray Imaging
 |
| 会议录出版者 | SPIE |
| 文献子类 | 会议论文 |
| 语种 | 英语 |
| ISSN号 | 0277-786X |
| WOS研究方向 | Engineering, Electrical & Electronic ; Optics ; Imaging Science & Photographic Technology |
| WOS记录号 | WOS:000473327700050 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9630]  |
| 专题 | 光电技术研究所_自适应光学技术研究室（八室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Science, Chengdu; 610209, China; 2.University of Chinese Academy of Sciences, Beijing; 100049, China |
| 推荐引用方式 GB/T 7714 | Long, Guoyun,Zhang, Yaoping. Fabrication and damage characteristics of low stress HR films for femtosecond laser system[C]. 见:. Hefei, China. November 26, 2018 - November 28, 2018. |
入库方式： OAI收割
来源：光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。