Simple and rapid particle detection device for substrate surface
文献类型：会议论文
| 作者 | Ai, Lifu1,2; Zhang, Jian1; Wang, Changtao1,2; Luo, Xiangang1,2 |
| 出版日期 | 2019 |
| 会议日期 | June 26, 2018 - June 29, 2018 |
| 会议地点 | Chengdu, China |
| 卷号 | 10841 |
| DOI | 10.1117/12.2505570 |
| 页码 | 1084106 |
| 英文摘要 | With the rapid development of lithography technology, the processing width of lithography line is up to 10 nm. The tiny defects on the surface of substrate and particles attached to the surface have a great influence on the quality of lithography, especially the surface plasmons lithography, which requires the gap between the substrate and the mask should be controlled within dozens of nanometers, since the surface defects and particles seriously affect the quality of the surface plasmons lithography. Substrate detection device in foreign countries is costly, and the results detected by optical microscopes and electron microscopes can't meet the requirements of the current experiment. Therefore, a set of scattering detection device needs to be developed in order to meet the requirement of the defect detection of the substrate surface. © 2019 SPIE. |
| 会议录 | Proceedings of SPIE 10841 - 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Meta-Surface-Wave and Planar Optics
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| 会议录出版者 | SPIE |
| 文献子类 | 会议论文 |
| 语种 | 英语 |
| ISSN号 | 0277-786X |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9623]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O.Box 350, Chengdu; 610209, China; 2.University of Chinese Academy of Sciences, Beijing; 100049, China |
| 推荐引用方式 GB/T 7714 | Ai, Lifu,Zhang, Jian,Wang, Changtao,et al. Simple and rapid particle detection device for substrate surface[C]. 见:. Chengdu, China. June 26, 2018 - June 29, 2018. |
入库方式： OAI收割
来源：光电技术研究所
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