Double-beam laser interference lithography based on optical field modulation
文献类型：会议论文
| 作者 | Peng, Fuping1,2; Yan, Wei1; Yang, Fan1,2; Li, Fanxing1,2 |
| 出版日期 | 2019 |
| 会议日期 | June 26, 2018 - June 29, 2018 |
| 会议地点 | Chengdu, China |
| 关键词 | interference optical field modulation function |
| 卷号 | 10842 |
| DOI | 10.1117/12.2510947 |
| 页码 | 108421C |
| 英文摘要 | In the micro-nano structure manufacturing field, large field of view, flexibility, and single exposure are the advantages of laser interference lithography. However, this method can only produce periodic patterns. In this paper, laser interference lithography and optical field modulation techniques are combined. By adjusting the parameters such as the phase and amplitude of the incident light beam, a light field modulation interference model was constructed to study the relationship between the parameters of the incident light beam and the intensity distribution of the interference light field. We verified the feasibility of the method through simulation. Considering the performance of existing optical modulation devices such as the pixel size of spatial light modulators, we discuss the challenges of this approach and the actual resolution that can be achieved. There is no doubt that this provides a new direction for the preparation of multiscale, variable period micro-nano patterns. © 2019 SPIE. |
| 会议录 | Proceedings of SPIE 10842 - 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
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| 会议录出版者 | SPIE |
| 文献子类 | 会议论文 |
| 语种 | 英语 |
| ISSN号 | 0277-786X |
| WOS研究方向 | Optics |
| WOS记录号 | WOS:000468819800046 |
| WOS关键词 | FABRICATION |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9624]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan; 610209, China 2.University of Chinese Academy of Sciences, Beijing; 10049, China; |
| 推荐引用方式 GB/T 7714 | Peng, Fuping,Yan, Wei,Yang, Fan,et al. Double-beam laser interference lithography based on optical field modulation[C]. 见:. Chengdu, China. June 26, 2018 - June 29, 2018. |
入库方式： OAI收割
来源：光电技术研究所
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