Large range nano alignment for proximity lithography using complex grating
文献类型:期刊论文
作者 | Tang, Yan; Liu, Junbo; Yang, Yong; Hu, Song; Zhao, Lixin; Si, Xinchun |
刊名 | Optics and Laser Technology
![]() |
出版日期 | 2019-04-15 |
卷号 | 112页码:101-106 |
ISSN号 | 0030-3992 |
DOI | 10.1016/j.optlastec.2018.10.049 |
文献子类 | 期刊论文 |
英文摘要 | We propose a novel alignment method with nanoscale precision and hundreds of microns detecting range for proximity lithography. With this method, both coarse and final alignments are realized by complex grating based on moiré fringe. For distinguishing the complex gratings in frequency spectrum, there is no interference between the coarse and the final alignment parts. Within only one pattern, modulation of the coarse mark and phase of the final mark can be calculated respectively. Combining the two results, we can do the alignment with nanoscale precision in large measurement range. Furthermore, the structure of our measurement system is simple. Simulation and experiments are carried out to validate the feasibility of the proposed method. © 2018 |
WOS关键词 | MOIRE FRINGE ; SYSTEM |
WOS研究方向 | Optics ; Physics, Applied |
语种 | 英语 |
WOS记录号 | WOS:000458941800013 |
出版者 | Elsevier Ltd |
源URL | [http://ir.ioe.ac.cn/handle/181551/9756] ![]() |
专题 | 光电技术研究所_微细加工光学技术国家重点实验室(开放室) |
作者单位 | State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China |
推荐引用方式 GB/T 7714 | Tang, Yan,Liu, Junbo,Yang, Yong,et al. Large range nano alignment for proximity lithography using complex grating[J]. Optics and Laser Technology,2019,112:101-106. |
APA | Tang, Yan,Liu, Junbo,Yang, Yong,Hu, Song,Zhao, Lixin,&Si, Xinchun.(2019).Large range nano alignment for proximity lithography using complex grating.Optics and Laser Technology,112,101-106. |
MLA | Tang, Yan,et al."Large range nano alignment for proximity lithography using complex grating".Optics and Laser Technology 112(2019):101-106. |
入库方式: OAI收割
来源:光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。