Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm
文献类型：期刊论文
| 作者 | Gao, Ping; Pu, Mingbo; Ma, Xiaoliang; Li, Xiong; Guo, Yinghui; Wang, Changtao; Zhao, Zeyu; Luo, Xiangang |
| 刊名 | Nanoscale
 |
| 出版日期 | 2020-01-28 |
| 卷号 | 12期号:4页码:2415-2421 |
| ISSN号 | 2040-3364 |
| DOI | 10.1039/c9nr08153d |
| 文献子类 | 期刊论文 |
| 英文摘要 | Aiming to further improve the resolution and quality of plasmonic lithography, a self-aligned patterning technique is introduced to it to obtain ultrafine nanopatterns with high contrast and low line edge error (LER). By improving the line edge roughness of the initial plasmonic lithography patterns, 16 nm half-pitch surface nanostructures with a height of 70 nm can be obtained. Moreover, with the help of plasma etching and atomic layer deposition in this process flow, the LER of the 16 nm half-pitch surface nanostructure can achieve 1.3 nm. Further application indicates that this process can also be used to fabricate nanoholes with the feature size as small as 9 nm. This approach provides a new perspective on the manufacture of surface nanostructures with ultrahigh resolution and high aspect ratios, which would find potentially promising applications in metal-air transistors, biosensors, DNA sequencing, etc. © 2020 The Royal Society of Chemistry. |
| 出版地 | CAMBRIDGE |
| WOS关键词 | ATOMIC LAYER DEPOSITION ; TEMPERATURE ; NANOLITHOGRAPHY ; RESOLUTION |
| WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000517839900018 |
| 出版者 | ROYAL SOC CHEMISTRY |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/10094]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu; 610209, China |
| 推荐引用方式 GB/T 7714 | Gao, Ping,Pu, Mingbo,Ma, Xiaoliang,et al. Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm[J]. Nanoscale,2020,12(4):2415-2421. |
| APA | Gao, Ping.,Pu, Mingbo.,Ma, Xiaoliang.,Li, Xiong.,Guo, Yinghui.,...&Luo, Xiangang.(2020).Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm.Nanoscale,12(4),2415-2421. |
| MLA | Gao, Ping,et al."Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm".Nanoscale 12.4(2020):2415-2421. |
入库方式： OAI收割
来源：光电技术研究所
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