中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Correction algorithm of edge effects in inductively coupled plasma processing

文献类型:期刊论文

作者Zhang, Shiyang1,3; Fan, Bin1,3; Wang, Yongjian1,3; Xin, Qiang1,3; Wu, Jie2
刊名Optik
出版日期2020-12-01
卷号223
ISSN号0030-4026
DOI10.1016/j.ijleo.2020.165565
文献子类期刊论文
英文摘要Atmospheric plasma processing is a new type of non-contact processing method. And it mainly aimed at the processing of optical components or freeform mirrors without surface damage. The edge effect in plasma processing will cause the removal function to be unstable, and the convergence efficiency will be reduced. Therefore, it is necessary to improve the stability of the removal function and reduce the edge effect. Therefore, in this paper, it will focus on the edge effect problem in plasma processing, analyze the cause of the edge effect, and propose solutions for the edge effect. And, it is found that the edge effect is caused by the removal function. The area which is influenced by the edge effect will be reduced when the size of the removal function is reduced. Moreover, it is found the relationship between the removal function and radial position. Finally, the processing error will be reduced from 20 % to 10 % with the correction algorithm, which is aimed at the dwell time algorithm. © 2020 Elsevier GmbH
语种英语
源URL[http://ir.ioe.ac.cn/handle/181551/10122]  
专题光电技术研究所_先光中心
作者单位1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China;
2.School of Mechanical Engineering, Sichuan University, Chengdu; 610065, China
3.University of Chinese Academy of Sciences, Beijing; 100049, China;
推荐引用方式
GB/T 7714
Zhang, Shiyang,Fan, Bin,Wang, Yongjian,et al. Correction algorithm of edge effects in inductively coupled plasma processing[J]. Optik,2020,223.
APA Zhang, Shiyang,Fan, Bin,Wang, Yongjian,Xin, Qiang,&Wu, Jie.(2020).Correction algorithm of edge effects in inductively coupled plasma processing.Optik,223.
MLA Zhang, Shiyang,et al."Correction algorithm of edge effects in inductively coupled plasma processing".Optik 223(2020).

入库方式: OAI收割

来源:光电技术研究所

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