中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Highly accurate positioned, rapid figure correction by reactive ion etching for large aperture lightweight membrane optical elements

文献类型:期刊论文

作者Li, Zhiwei; Shao, Junming; Luo, Qian; Lei, Boping; Gao, Guohan; Bian, Jiang; Wu, Shibin; Fan, Bin
刊名OSA Continuum
出版日期2019-12-15
卷号2期号:12页码:3350-3357
DOI10.1364/OSAC.2.003350
文献子类期刊论文
英文摘要Diffractive membrane optics has been expected to meet the requirement of large aperture space-based telescopes. However, the flexible membrane has different properties from traditional materials that the desired geometrical form is hardly obtained by current ultra-precision surface manufacturing technologies. A 400 mm aperture membrane substrate was figure-corrected by reactive ion etching from the initial figure error of 105 nm rms to the final figure error of ∼17 nm rms in total effective figuring time of ∼7.5 minutes. The RIE figuring technique with high position accuracy, nanometer level repeatability, and parallel removal manner has exhibited huge potential in figure correction. © 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
语种英语
出版者OSA - The Optical Society
源URL[http://ir.ioe.ac.cn/handle/181551/9785]  
专题薄膜光学相机总体室
作者单位Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China
推荐引用方式
GB/T 7714
Li, Zhiwei,Shao, Junming,Luo, Qian,et al. Highly accurate positioned, rapid figure correction by reactive ion etching for large aperture lightweight membrane optical elements[J]. OSA Continuum,2019,2(12):3350-3357.
APA Li, Zhiwei.,Shao, Junming.,Luo, Qian.,Lei, Boping.,Gao, Guohan.,...&Fan, Bin.(2019).Highly accurate positioned, rapid figure correction by reactive ion etching for large aperture lightweight membrane optical elements.OSA Continuum,2(12),3350-3357.
MLA Li, Zhiwei,et al."Highly accurate positioned, rapid figure correction by reactive ion etching for large aperture lightweight membrane optical elements".OSA Continuum 2.12(2019):3350-3357.

入库方式: OAI收割

来源:光电技术研究所

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