Nonuniform self-imaging of achromatic Talbot lithography
文献类型：期刊论文
| 作者 | Xia, HJ; Yang, SM; Wang, LS; Zhao, J; Xue, CF; Wu, YQ; Tai, RZ |
| 刊名 | CHINESE OPTICS LETTERS
 |
| 出版日期 | 2019 |
| 卷号 | 17期号:6页码:- |
| 关键词 | INTERFEROMETRIC LITHOGRAPHY INTERFERENCE |
| ISSN号 | 1671-7694 |
| DOI | 10.3788/COL201917.062201 |
| 文献子类 | 期刊论文 |
| 英文摘要 | Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an excellent technique for large area periodic nano-fabrication. In this work, the uniformity of pattern distribution in ATL was studied in detail. Two ATL transmission masks with similar to 50% duty cycle in a square lattice were illuminated by a spatial coherent broadband extreme ultraviolet beam with a relative bandwidth of 2.38%. Nonuniform dot size distribution was observed by experiments and finite-difference time-domain simulations. The sum of the two kinds of diffraction patterns, with different lattice directions (45 degrees rotated) and different intensity distributions, results in the final nonuniform pattern distribution. |
| 语种 | 英语 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/32143]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 作者单位 | 1.Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China; 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China; 3.Shanghai Adv Res Inst, Shanghai Synchrotron Radiat Facil, Shanghai 201204, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xia, HJ,Yang, SM,Wang, LS,et al. Nonuniform self-imaging of achromatic Talbot lithography[J]. CHINESE OPTICS LETTERS,2019,17(6):-. |
| APA | Xia, HJ.,Yang, SM.,Wang, LS.,Zhao, J.,Xue, CF.,...&Tai, RZ.(2019).Nonuniform self-imaging of achromatic Talbot lithography.CHINESE OPTICS LETTERS,17(6),-. |
| MLA | Xia, HJ,et al."Nonuniform self-imaging of achromatic Talbot lithography".CHINESE OPTICS LETTERS 17.6(2019):-. |
入库方式： OAI收割
来源：上海应用物理研究所
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