A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism
文献类型：期刊论文
| 作者 | Wei Ding; Hui Tong; Dan Zhao; Huaili Zheng; Chengshuai Liu; Jinjun Li; Feng Wu |
| 刊名 | Chemical Engineering Journal
 |
| 出版日期 | 2020 |
| 卷号 | 401页码:126102 |
| DOI | 10.1016/j.cej.2020.126102 |
| URL标识 | 查看原文 |
| 语种 | 英语 |
| 源URL | [http://ir.gyig.ac.cn/handle/42920512-1/11433]  |
| 专题 | 地球化学研究所_环境地球化学国家重点实验室_环境地球化学国家重点实验室_期刊论文 |
| 作者单位 | 1.Guangdong Key Laboratory of Agro-environmental Pollution Control and Management, Guangdong Institute of Eco-environmental Science & Technology, Guangzhou 510650, PR China 2.School of Resources and Environmental Science, Wuhan University, Wuhan, 430079, China 3.College of Environment and Ecology, Chongqing University, Chongqing, 400044, China 4.State Key Laboratory of Environmental Geochemistry, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang, 550081, China |
| 推荐引用方式 GB/T 7714 | Wei Ding,Hui Tong,Dan Zhao,et al. A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism[J]. Chemical Engineering Journal,2020,401:126102. |
| APA | Wei Ding.,Hui Tong.,Dan Zhao.,Huaili Zheng.,Chengshuai Liu.,...&Feng Wu.(2020).A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism.Chemical Engineering Journal,401,126102. |
| MLA | Wei Ding,et al."A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism".Chemical Engineering Journal 401(2020):126102. |
入库方式： OAI收割
来源：地球化学研究所
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