Preparation and properties of ZnO : Al (ZAO) thin films deposited by DC reactive magnetron sputtering
文献类型：期刊论文
| 作者 | Pei, ZL; Zhang, XB; Wang, TG; Gong, J; Sun, C; Wen, LS |
| 刊名 | ACTA METALLURGICA SINICA
 |
| 出版日期 | 2005 |
| 卷号 | 41期号:1页码:84-88 |
| 关键词 | DC reactive magnetron sputtering ZAO film growth mechanism electrical and optical propertie |
| ISSN号 | 0412-1961 |
| 通讯作者 | Pei, ZL(zlpei@imr.ac.cn) |
| 英文摘要 | Al-doped ZnO(ZAO) layers have been prepared by reactive DC magnetron sputtering from Zn:2.0%Al (mass fraction) alloy target on glass and silicon wafer substrates. The influences of the deposition parameters on the crystallization behavior as well as electrical and optical properties of ZAO films have been investigated. The crystallinity of the films was improved and the columnar crystalline growth became dominant as the substrate temperature increased. All the films show a compressive stress, which increased as the DC power increased, while it decreased as the substrate temperature was raised. Optical transmittance up to 80% in the visible range and electrical resistivity as low as 3 x 10(-4) - 4 x 10(-4) Omega (.) cm were obtained under optimal deposition conditions. |
| WOS研究方向 | Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000227020500016 |
| 出版者 | SCIENCE PRESS |
| 源URL | [http://ir.imr.ac.cn/handle/321006/85153]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Pei, ZL |
| 作者单位 | Chinese Acad Sci, Met Res Inst, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Pei, ZL,Zhang, XB,Wang, TG,et al. Preparation and properties of ZnO : Al (ZAO) thin films deposited by DC reactive magnetron sputtering[J]. ACTA METALLURGICA SINICA,2005,41(1):84-88. |
| APA | Pei, ZL,Zhang, XB,Wang, TG,Gong, J,Sun, C,&Wen, LS.(2005).Preparation and properties of ZnO : Al (ZAO) thin films deposited by DC reactive magnetron sputtering.ACTA METALLURGICA SINICA,41(1),84-88. |
| MLA | Pei, ZL,et al."Preparation and properties of ZnO : Al (ZAO) thin films deposited by DC reactive magnetron sputtering".ACTA METALLURGICA SINICA 41.1(2005):84-88. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。