Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films
文献类型：期刊论文
| 作者 | Wang, Aiying; Lee, Kwangryeol; Sun, Chao; Wen, Lishi |
| 刊名 | JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
 |
| 出版日期 | 2006-09-01 |
| 卷号 | 22期号:5页码:599-604 |
| 关键词 | gas physical parameters simulations diamond films HFCVD |
| ISSN号 | 1005-0302 |
| 通讯作者 | Wang, Aiying(aywang@kist.re.kr) |
| 英文摘要 | During the growth of the hot filament chemical vapor deposition (HFCVD) diamond films, numerical simulations in a 2-D mathematical model were employed to investigate the influence of various deposition parameters on the gas physical parameters, including the temperature, velocity and volume density of gas. It was found that, even in the case of optimized deposition parameters, the space distributions of gas parameters were heterogeneous due primarily to the thermal blockage come from the hot filaments and cryogenic pump effect arisen from the cold reactor wall. The distribution of volume density agreed well with the. thermal round-flow phenomenon, one of the key obstacles to obtaining high growth rate in HFCVD process. In virtue of isothermal boundary with high temperature or adiabatic boundary condition of reactor wall, however, the thermal round-flow was profoundly reduced and as a consequence, the uniformity of gas physical parameters was considerably improved, as identified by the experimental films growth. |
| WOS研究方向 | Materials Science ; Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000241099400006 |
| 出版者 | JOURNAL MATER SCI TECHNOL |
| 源URL | [http://ir.imr.ac.cn/handle/321006/86375]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Wang, Aiying |
| 作者单位 | 1.J&L Tech Co Ltd, Plasma Lab, Sicheung 21857, Kyunggi Do, South Korea 2.Korea Inst Sci & Technol, Future Technol Res Div, Seoul 130650, South Korea 3.Chinese Acad Sci, Met Res Inst, Dept Surface Engn Mat, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Aiying,Lee, Kwangryeol,Sun, Chao,et al. Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2006,22(5):599-604. |
| APA | Wang, Aiying,Lee, Kwangryeol,Sun, Chao,&Wen, Lishi.(2006).Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,22(5),599-604. |
| MLA | Wang, Aiying,et al."Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 22.5(2006):599-604. |
入库方式： OAI收割
来源：金属研究所
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