Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation
文献类型：期刊论文
| 作者 | Deng, W; Zhu, YY; Zhou, YN; Huang, YY; Cao, MZ; Xiong, LY |
| 刊名 | RARE METAL MATERIALS AND ENGINEERING
 |
| 出版日期 | 2006-03-01 |
| 卷号 | 35期号:3页码:348-351 |
| 关键词 | TiAl alloy electron density microdefect positron annihilation |
| ISSN号 | 1002-185X |
| 通讯作者 | Deng, W() |
| 英文摘要 | Positron lifetime spectra of Ti50Al50, Ti50Al48V2, Ti50Al48Ag2 alloys and annealed Ti, Al, Ag, V metals were measured. The electron densities in the bulk and defects of the alloys were calculated by positron lifetime parameters. The poor ductility of binary TiAl alloy is related to low free electron densities in the bulk and the grain boundaries of the alloy. When V are added into Ti-rich TiAl alloy, V atoms will provide more free electrons than both Al and Ti atoms to participate in metallic bonds, thus increasing the electron densities in the bulk and the grain boundary simultaneously. Ag additions appear to have an effect similar to V additions. Both V and Ag are benefit elements in enhancing the ductility of TiAl alloys. |
| WOS研究方向 | Materials Science ; Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000236600300004 |
| 出版者 | NORTHWEST INST NONFERROUS METAL RESEARCH |
| 源URL | [http://ir.imr.ac.cn/handle/321006/88467]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Deng, W |
| 作者单位 | 1.Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110016, Peoples R China 2.Guangxi Univ, Dept Phys, Nanning 530004, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Deng, W,Zhu, YY,Zhou, YN,et al. Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation[J]. RARE METAL MATERIALS AND ENGINEERING,2006,35(3):348-351. |
| APA | Deng, W,Zhu, YY,Zhou, YN,Huang, YY,Cao, MZ,&Xiong, LY.(2006).Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation.RARE METAL MATERIALS AND ENGINEERING,35(3),348-351. |
| MLA | Deng, W,et al."Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation".RARE METAL MATERIALS AND ENGINEERING 35.3(2006):348-351. |
入库方式： OAI收割
来源：金属研究所
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