中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Strain status in ZnO film on sapphire substrate with a GaN buffer layer grown by metal-source vapor phase epitaxy

文献类型:期刊论文

作者Cui, J. P.; Duan, Y.; Wang, X. F.; Zeng, Y. P.
刊名MICROELECTRONICS JOURNAL
出版日期2008-12-01
卷号39期号:12页码:1542-1544
关键词ZnO film Strain status GaN buffer layer Sapphire MVPE
ISSN号0026-2692
DOI10.1016/j.mejo.2008.03.002
通讯作者Cui, J. P.(jpcui@semi.ac.cn)
英文摘要ZnO film of 8 mu m thickness was grown on a sapphire (0 0 1) substrate with a GaN buffer layer by a novel growth technique called metal-source vapor phase epitaxy (MVPE). The surface of ZnO film measured by scanning electron microscope (SEM) is smooth and shows many regular hexagonal features. The full width at half maximum (FWHM) of ZnO(0 0 2) and (1 0 2) omega-scan rocking curves are 119 and 202 arcsec, corresponding a high crystal quality. The status of the strain in ZnO thick film was particularly analyzed by X-ray diffraction (XRD) omega-20 scanning. The results show that the strain in ZnO film is compressive, which is also supported by Raman scattering spectroscopy. The compressive strain can solve the cracking problem in the quick growth of ZnO thick film. (c) 2008 Elsevier Ltd. All rights reserved.
WOS研究方向Engineering ; Science & Technology - Other Topics
语种英语
WOS记录号WOS:000261647800028
出版者ELSEVIER SCI LTD
源URL[http://ir.imr.ac.cn/handle/321006/94051]  
专题金属研究所_中国科学院金属研究所
通讯作者Cui, J. P.
作者单位Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Cui, J. P.,Duan, Y.,Wang, X. F.,et al. Strain status in ZnO film on sapphire substrate with a GaN buffer layer grown by metal-source vapor phase epitaxy[J]. MICROELECTRONICS JOURNAL,2008,39(12):1542-1544.
APA Cui, J. P.,Duan, Y.,Wang, X. F.,&Zeng, Y. P..(2008).Strain status in ZnO film on sapphire substrate with a GaN buffer layer grown by metal-source vapor phase epitaxy.MICROELECTRONICS JOURNAL,39(12),1542-1544.
MLA Cui, J. P.,et al."Strain status in ZnO film on sapphire substrate with a GaN buffer layer grown by metal-source vapor phase epitaxy".MICROELECTRONICS JOURNAL 39.12(2008):1542-1544.

入库方式: OAI收割

来源:金属研究所

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