Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes
文献类型：期刊论文
| 作者 | Xu, Junli2; Li, Ying1; Wang, Fuhui1 |
| 刊名 | ELECTROCHIMICA ACTA
 |
| 出版日期 | 2009-12-15 |
| 卷号 | 55期号:1页码:148-154 |
| ISSN号 | 0013-4686 |
| 关键词 | Thin film Partial substitution Faradic admittance Hydrogen diffusivity Electronic properties |
| DOI | 10.1016/j.electacta.2009.08.024 |
| 通讯作者 | Li, Ying(liying@imr.ac.cn) |
| 英文摘要 | Thin films of Mg2-xAlxNi alloys have been prepared by magnetron sputtering, and the effects of partial substitution of Al for Mg on the electrochemical properties of the films were studied. EIS results indicate the rate-limiting process for the thin film hydride electrode is the charge transfer reaction during the process of total discharge. A theoretical model has been derived for the impedance of a thin film hydride electrode based upon the assumption that hydrogen diffusion is neglected in the electrode. The charge-transfer reaction rate at the electrode surface and hydrogen diffusivity in the Mg2-xAlxNi thin film hydride electrodes were observed to initially decrease then increase with increasing Al content. Results from capacitance measurements indicate n-type semiconductor properties for the corrosion layer during the charge-discharge process. Hydrogen atom and OH- transfer became more difficult with increasing Al content until x=0.3, after which a significant drop in the barrier resistance was observed. (C) 2009 Elsevier Ltd. All rights reserved. |
| WOS研究方向 | Electrochemistry |
| 语种 | 英语 |
| 出版者 | PERGAMON-ELSEVIER SCIENCE LTD |
| WOS记录号 | WOS:000271152200019 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/95790]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Li, Ying |
| 作者单位 | 1.Chinese Acad Sci, State Key Lab Corros & Protect, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.Northeastern Univ, Coll Sci, Shenyang 110004, Liaoning, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu, Junli,Li, Ying,Wang, Fuhui. Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes[J]. ELECTROCHIMICA ACTA,2009,55(1):148-154. |
| APA | Xu, Junli,Li, Ying,&Wang, Fuhui.(2009).Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes.ELECTROCHIMICA ACTA,55(1),148-154. |
| MLA | Xu, Junli,et al."Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes".ELECTROCHIMICA ACTA 55.1(2009):148-154. |
入库方式： OAI收割
来源：金属研究所
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