Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl
文献类型：期刊论文
| 作者 | Cheng, Y. X.; Wang, W.; Zhu, S. L.; Xin, L.; Wang, F. H. |
| 刊名 | INTERMETALLICS
 |
| 出版日期 | 2010-04-01 |
| 卷号 | 18期号:4页码:736-739 |
| 关键词 | Titanium aluminides, based on TiAl Oxidation Diffusion Vapour deposition |
| ISSN号 | 0966-9795 |
| DOI | 10.1016/j.intermet.2009.10.009 |
| 通讯作者 | Cheng, Y. X.(yxcheng@imr.ac.cn) |
| 英文摘要 | The effectiveness of an arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl was evaluated by annealing at 1000 degrees C. The results showed that Cr2O3 acted as an active diffusion barrier by formation of two continuous Al-rich oxide layers at both the TiAl/Cr2O3 and Cr2O3/NiCrAlY interfaces, suppressing the inward diffusion of Ni from NiCrAlY overlay coating to gamma-TiAl substrate effectively. (C) 2009 Elsevier Ltd. All rights reserved. |
| 资助项目 | National Natural Science Foundation of China[50774074] |
| WOS研究方向 | Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000276058200049 |
| 出版者 | ELSEVIER SCI LTD |
| 资助机构 | National Natural Science Foundation of China |
| 源URL | [http://ir.imr.ac.cn/handle/321006/101143]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Cheng, Y. X. |
| 作者单位 | Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Cheng, Y. X.,Wang, W.,Zhu, S. L.,et al. Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl[J]. INTERMETALLICS,2010,18(4):736-739. |
| APA | Cheng, Y. X.,Wang, W.,Zhu, S. L.,Xin, L.,&Wang, F. H..(2010).Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl.INTERMETALLICS,18(4),736-739. |
| MLA | Cheng, Y. X.,et al."Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl".INTERMETALLICS 18.4(2010):736-739. |
入库方式： OAI收割
来源：金属研究所
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