Multi-wafer 3C-SiC heteroepitaxial growth on Si(100) substrates
文献类型:期刊论文
作者 | Sun Guo-Sheng1,2; Liu Xing-Fang1,2; Wang Lei1; Zhao Wan-Shun1; Yang Ting1; Wu Hai-Lei1; Yan Guo-Guo1; Zhao Yong-Mei3; Ning Jin3; Zeng Yi-Ping1,2 |
刊名 | CHINESE PHYSICS B
![]() |
出版日期 | 2010-08-01 |
卷号 | 19期号:8页码:5 |
关键词 | 3C-SiC heteroepitaxial multi-wafer uniformity |
ISSN号 | 1674-1056 |
通讯作者 | Sun Guo-Sheng(gshsun@red.semi.ac.cn) |
英文摘要 | Epitaxial growth of semiconductor films in multiple-wafer mode is under vigorous development in order to improve yield output to meet the industry increasing demands. Here we report on results of the heteroepitaxial growth of multi-wafer 3C-SiC films on Si(100) substrates by employing a home-made horizontal hot wall low pressure chemical vapour deposition (HWLPCVD) system which was designed to be have a high-throughput, multi-wafer (3x2-inch) capacity. 3C-SiC film properties of the intra-wafer and the wafer-to-wafer including crystalline morphologies, structures and electronics are characterized systematically. The undoped and the moderate NH(3) doped n-type 3C-SiC films with specular surface are grown in the HWLPCVD, thereafter uniformities of intra-wafer thickness and sheet resistance of the 3C-SiC films are obtained to be 6%similar to 7% and 6.7%similar to 8%, respectively, and within a run, the deviations of wafer-to-wafer thickness and sheet resistance are less than 1% and 0.8%, respectively. |
资助项目 | National Natural Science Foundation of China[60876003] ; National Natural Science Foundation of China[60606003] ; Chinese Academy of Sciences[yz200702] |
WOS研究方向 | Physics |
语种 | 英语 |
WOS记录号 | WOS:000280741800091 |
出版者 | IOP PUBLISHING LTD |
资助机构 | National Natural Science Foundation of China ; Chinese Academy of Sciences |
源URL | [http://ir.imr.ac.cn/handle/321006/101283] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
通讯作者 | Sun Guo-Sheng |
作者单位 | 1.Chinese Acad Sci, Ctr Mat Sci, Inst Semicond, Beijing 100083, Peoples R China 2.Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100083, Peoples R China 3.Chinese Acad Sci, State Key Lab Transducer Technol, Beijing 100083, Peoples R China |
推荐引用方式 GB/T 7714 | Sun Guo-Sheng,Liu Xing-Fang,Wang Lei,et al. Multi-wafer 3C-SiC heteroepitaxial growth on Si(100) substrates[J]. CHINESE PHYSICS B,2010,19(8):5. |
APA | Sun Guo-Sheng.,Liu Xing-Fang.,Wang Lei.,Zhao Wan-Shun.,Yang Ting.,...&Li Jin-Min.(2010).Multi-wafer 3C-SiC heteroepitaxial growth on Si(100) substrates.CHINESE PHYSICS B,19(8),5. |
MLA | Sun Guo-Sheng,et al."Multi-wafer 3C-SiC heteroepitaxial growth on Si(100) substrates".CHINESE PHYSICS B 19.8(2010):5. |
入库方式: OAI收割
来源:金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。