The synthesis of LiBH4 films under low hydrogen pressure at ambient temperature
文献类型:期刊论文
作者 | Haiping, Wang1,2,3; Weidong, Wu1; Tiecheng, Lu1,2,3,4; Xuemin, Wang1; Fangfang, Ge1; Linhong, Cao1; Li, Bai1; Yang, Dai1 |
刊名 | MATERIALS LETTERS
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出版日期 | 2010-02-15 |
卷号 | 64期号:3页码:320-322 |
关键词 | Lithium borohydride Pulsed laser deposition Thin films Deposition |
ISSN号 | 0167-577X |
DOI | 10.1016/j.matlet.2009.11.003 |
通讯作者 | Weidong, Wu(wuweidongding@163.com) |
英文摘要 | Lithium borohydride (LiBH4) films were first fabricated under low hydrogen pressure (5-70 Pa) at ambient temperature by pulsed laser deposition (PLD). The atomistic structures and chemical compositions of the films were investigated. It was found that during the formation process of LiBH4, the intermediate compound Li2B12H12 was formed. As the hydrogen pressure increased up to 70 Pa. the relative weight percent of LiBH4 was over 70 wt.% even at ambient temperature. Moreover, the stress of the films was decreased as the hydrogen pressure increased. (C) 2009 Elsevier B.V. All rights reserved. |
WOS研究方向 | Materials Science ; Physics |
语种 | 英语 |
WOS记录号 | WOS:000274164500028 |
出版者 | ELSEVIER SCIENCE BV |
源URL | [http://ir.imr.ac.cn/handle/321006/101390] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
通讯作者 | Weidong, Wu |
作者单位 | 1.CAEP, Res Ctr Laser Fus, Mianyang 621900, Peoples R China 2.Sichuan Univ, Minist Educ, Dept Phys, Chengdu 610064, Peoples R China 3.Sichuan Univ, Minist Educ, Key Lab Radiat Phys & Technol, Chengdu 610064, Peoples R China 4.Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110015, Peoples R China |
推荐引用方式 GB/T 7714 | Haiping, Wang,Weidong, Wu,Tiecheng, Lu,et al. The synthesis of LiBH4 films under low hydrogen pressure at ambient temperature[J]. MATERIALS LETTERS,2010,64(3):320-322. |
APA | Haiping, Wang.,Weidong, Wu.,Tiecheng, Lu.,Xuemin, Wang.,Fangfang, Ge.,...&Yang, Dai.(2010).The synthesis of LiBH4 films under low hydrogen pressure at ambient temperature.MATERIALS LETTERS,64(3),320-322. |
MLA | Haiping, Wang,et al."The synthesis of LiBH4 films under low hydrogen pressure at ambient temperature".MATERIALS LETTERS 64.3(2010):320-322. |
入库方式: OAI收割
来源:金属研究所
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