Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale
文献类型：期刊论文
| 作者 | Zhan, Q; Yu, R; He, LL; Li, DX; Guo, XN |
| 刊名 | ACTA METALLURGICA SINICA
 |
| 出版日期 | 2001-04-18 |
| 卷号 | 37期号:4页码:337-339 |
| 关键词 | low-emissivity film microstructure HREM nanometer-beam analysis |
| ISSN号 | 0412-1961 |
| 通讯作者 | Zhan, Q() |
| 英文摘要 | The cross-sectional samples of TiO2-Ag-TiO2-SiO multilayer films are prepared and their microstructures are studied by TEM, HREM and nanobeam EDS analysis. The results show that the thickness of every layer is uniform and the interface is sharp and smooth. The Ag layer is nanocrystal while TiO2 and SiO are amorphous. Nanometer-beam EDS, analysis demonstrated that diffusion of Ag did not occur, which is a strong factor to ensure the whole film's properties. |
| WOS研究方向 | Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000172766600001 |
| 出版者 | SCIENCE CHINA PRESS |
| 源URL | [http://ir.imr.ac.cn/handle/321006/113592]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Zhan, Q |
| 作者单位 | 1.Shanghai Jiao Tong Univ, Inst Mat, Shanghai 200030, Peoples R China 2.Chinese Acad Sci, Met Res Inst, Atom Imaging Solids Lab, Shenyang 110046, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhan, Q,Yu, R,He, LL,et al. Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale[J]. ACTA METALLURGICA SINICA,2001,37(4):337-339. |
| APA | Zhan, Q,Yu, R,He, LL,Li, DX,&Guo, XN.(2001).Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale.ACTA METALLURGICA SINICA,37(4),337-339. |
| MLA | Zhan, Q,et al."Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale".ACTA METALLURGICA SINICA 37.4(2001):337-339. |
入库方式： OAI收割
来源：金属研究所
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