Numerical study of temperature field in HFCVD diamond films
文献类型：期刊论文
| 作者 | Wang, AY; Sun, C; Zou, YS; Huang, RF; Wen, LS |
| 刊名 | ACTA METALLURGICA SINICA
 |
| 出版日期 | 2002-11-01 |
| 卷号 | 38期号:11页码:1228-1232 |
| 关键词 | diamond film irradiance temperature field heat conduction HFCVD |
| ISSN号 | 0412-1961 |
| 通讯作者 | Wang, AY() |
| 英文摘要 | When the relative parameters of hot filaments were fixed at the optimal values, the irradiance distribution and the temperature distribution of substrate were simulated during the growing process HFCVD diamond films. Considering the effect of heat conduction, the substrate temperature distributions under the condition of adiabatic border and 1000 K isothermal border are more uniform than those in pure heat radiation system. All these results may provide the basis for the growth of diamond films in HFCVD. |
| WOS研究方向 | Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000179827800019 |
| 出版者 | SCIENCE CHINA PRESS |
| 源URL | [http://ir.imr.ac.cn/handle/321006/114079]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Wang, AY |
| 作者单位 | Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, AY,Sun, C,Zou, YS,et al. Numerical study of temperature field in HFCVD diamond films[J]. ACTA METALLURGICA SINICA,2002,38(11):1228-1232. |
| APA | Wang, AY,Sun, C,Zou, YS,Huang, RF,&Wen, LS.(2002).Numerical study of temperature field in HFCVD diamond films.ACTA METALLURGICA SINICA,38(11),1228-1232. |
| MLA | Wang, AY,et al."Numerical study of temperature field in HFCVD diamond films".ACTA METALLURGICA SINICA 38.11(2002):1228-1232. |
入库方式： OAI收割
来源：金属研究所
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