Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition
文献类型:期刊论文
作者 | Fang, GJ; Liu, ZL; Yao, KL |
刊名 | JOURNAL OF INORGANIC MATERIALS
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出版日期 | 2002 |
卷号 | 17期号:1页码:139-144 |
关键词 | WO3 thin films nano-crystalline PLD technique structural analyses preparation conditions Si (111) |
ISSN号 | 1000-324X |
通讯作者 | Fang, GJ() |
英文摘要 | WO,, thin films were successfully synthesized on Si (111) substrate at different conditions by using scanning excimer laser ablation technique. The structure of WOx thin films deposited at different conditions was analyzed by STEM, XRD, RS. The thin films deposited at 300 and 400degreesC under 20Pa oxygen pressure showed nano-crystalline triclinic structure. The experimental results illustrate that the oxygen pressure and the deposition temperature are two important parameters for determining the structure and chemical composition of the synthesized thin films. |
WOS研究方向 | Materials Science |
语种 | 英语 |
WOS记录号 | WOS:000174436700023 |
出版者 | SCIENCE CHINA PRESS |
源URL | [http://ir.imr.ac.cn/handle/321006/114895] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
通讯作者 | Fang, GJ |
作者单位 | 1.Huazhong Univ Sci & Technol, Natl Lab Laser Technol, Wuhan 430074, Peoples R China 2.Huazhong Univ Sci & Technol, Dept Phys, Wuhan 430074, Peoples R China 3.Xiangfan Univ, Dept Phys, Xiangtan 441053, Peoples R China 4.Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110015, Peoples R China |
推荐引用方式 GB/T 7714 | Fang, GJ,Liu, ZL,Yao, KL. Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition[J]. JOURNAL OF INORGANIC MATERIALS,2002,17(1):139-144. |
APA | Fang, GJ,Liu, ZL,&Yao, KL.(2002).Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition.JOURNAL OF INORGANIC MATERIALS,17(1),139-144. |
MLA | Fang, GJ,et al."Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition".JOURNAL OF INORGANIC MATERIALS 17.1(2002):139-144. |
入库方式: OAI收割
来源:金属研究所
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