中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition

文献类型:期刊论文

作者Fang, GJ; Liu, ZL; Yao, KL
刊名JOURNAL OF INORGANIC MATERIALS
出版日期2002
卷号17期号:1页码:139-144
关键词WO3 thin films nano-crystalline PLD technique structural analyses preparation conditions Si (111)
ISSN号1000-324X
通讯作者Fang, GJ()
英文摘要WO,, thin films were successfully synthesized on Si (111) substrate at different conditions by using scanning excimer laser ablation technique. The structure of WOx thin films deposited at different conditions was analyzed by STEM, XRD, RS. The thin films deposited at 300 and 400degreesC under 20Pa oxygen pressure showed nano-crystalline triclinic structure. The experimental results illustrate that the oxygen pressure and the deposition temperature are two important parameters for determining the structure and chemical composition of the synthesized thin films.
WOS研究方向Materials Science
语种英语
WOS记录号WOS:000174436700023
出版者SCIENCE CHINA PRESS
源URL[http://ir.imr.ac.cn/handle/321006/114895]  
专题金属研究所_中国科学院金属研究所
通讯作者Fang, GJ
作者单位1.Huazhong Univ Sci & Technol, Natl Lab Laser Technol, Wuhan 430074, Peoples R China
2.Huazhong Univ Sci & Technol, Dept Phys, Wuhan 430074, Peoples R China
3.Xiangfan Univ, Dept Phys, Xiangtan 441053, Peoples R China
4.Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110015, Peoples R China
推荐引用方式
GB/T 7714
Fang, GJ,Liu, ZL,Yao, KL. Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition[J]. JOURNAL OF INORGANIC MATERIALS,2002,17(1):139-144.
APA Fang, GJ,Liu, ZL,&Yao, KL.(2002).Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition.JOURNAL OF INORGANIC MATERIALS,17(1),139-144.
MLA Fang, GJ,et al."Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition".JOURNAL OF INORGANIC MATERIALS 17.1(2002):139-144.

入库方式: OAI收割

来源:金属研究所

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