Microstructure and hardness of chromium oxide coatings by arc ion plating
文献类型：期刊论文
| 作者 | Ji, AL; Wang, W; Song, GH; Wang, AY; Sin, C; Wen, LS |
| 刊名 | ACTA METALLURGICA SINICA
 |
| 出版日期 | 2003-09-01 |
| 卷号 | 39期号:9页码:979-983 |
| 关键词 | Cr2O3 thin film arc ion plating microstructure pulse bias voltage |
| ISSN号 | 0412-1961 |
| 通讯作者 | Ji, AL() |
| 英文摘要 | Chromium oxide thin film was deposited on stainless steel by arc ion plating (ATP). The effects of the flow rate of oxygen and pulse bias voltage on the structure, deposition rate and the surface morphology of thin film were studied. The microhardness of thin film was measured at different pulse bias voltage. The results show that the Cr2O3 film has {001} plane texture at the oxygen flow rate of 130 cm(3)/s and a bias voltage of -100 V. The higher the oxygen flow rate and bias voltage, the less the big particles in the thin film. Stoichiometric Cr2O3 thin film obtained at oxygen flow rate of 130 cm(3)/s and a bias voltage of -200 V has an optimal hardness value up to 36 GPa. |
| WOS研究方向 | Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000186144000016 |
| 出版者 | SCIENCE CHINA PRESS |
| 源URL | [http://ir.imr.ac.cn/handle/321006/117546]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Ji, AL |
| 作者单位 | Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Ji, AL,Wang, W,Song, GH,et al. Microstructure and hardness of chromium oxide coatings by arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(9):979-983. |
| APA | Ji, AL,Wang, W,Song, GH,Wang, AY,Sin, C,&Wen, LS.(2003).Microstructure and hardness of chromium oxide coatings by arc ion plating.ACTA METALLURGICA SINICA,39(9),979-983. |
| MLA | Ji, AL,et al."Microstructure and hardness of chromium oxide coatings by arc ion plating".ACTA METALLURGICA SINICA 39.9(2003):979-983. |
入库方式： OAI收割
来源：金属研究所
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