中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Improvement of tensile strength of CVD SiC fiber

文献类型:期刊论文

作者Shi, NL; Luo, K; Zu, YP
刊名ADVANCED MATERIALS PROCESSING II
出版日期2003
卷号437-4页码:73-76
关键词electrochemical methods SiC fiber surface treatment tensile strength
ISSN号0255-5476
通讯作者Shi, NL()
英文摘要A thin film Of SiO2 was formed on the surface of CVD SiC fiber by electrochemical treatment. The tensile strength of the fiber was increased effectively. The formation of the thin film of SiO2 heals the surface defects and makes the surface of the SiC fiber relatively smooth. The SiO2 film also creates a compression stress on the surface of the fiber, which can alleviate the locally concentrated tension and the surface damage sensitivity. Moreover, it can also cause an additional energy consumption to overcome the surface compressive stress during tensile loading of SiC fiber.
WOS研究方向Materials Science
语种英语
WOS记录号WOS:000185937400015
出版者TRANS TECH PUBLICATIONS LTD
源URL[http://ir.imr.ac.cn/handle/321006/117639]  
专题金属研究所_中国科学院金属研究所
通讯作者Shi, NL
作者单位Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式
GB/T 7714
Shi, NL,Luo, K,Zu, YP. Improvement of tensile strength of CVD SiC fiber[J]. ADVANCED MATERIALS PROCESSING II,2003,437-4:73-76.
APA Shi, NL,Luo, K,&Zu, YP.(2003).Improvement of tensile strength of CVD SiC fiber.ADVANCED MATERIALS PROCESSING II,437-4,73-76.
MLA Shi, NL,et al."Improvement of tensile strength of CVD SiC fiber".ADVANCED MATERIALS PROCESSING II 437-4(2003):73-76.

入库方式: OAI收割

来源:金属研究所

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