Investigations of helium incorporated into a film deposited by magnetron sputtering
文献类型：期刊论文
| 作者 | Liu, Chao-Zhuo; Shi, L. Q.; Zhou, Z. Y.; Hao, X. P.; Wang, B. Y.; Liu, S.; Wang, L. B. |
| 刊名 | JOURNAL OF PHYSICS D-APPLIED PHYSICS
 |
| 出版日期 | 2007-04-07 |
| 卷号 | 40期号:7页码:2150-2156 |
| ISSN号 | 0022-3727 |
| DOI | 10.1088/0022-3727/40/7/044 |
| 通讯作者 | Liu, Chao-Zhuo(czliu@fudan.edu.cn) |
| 英文摘要 | Helium-containing titanium film was prepared by magnetron sputtering in a gas mixture of helium and argon. This method distinctly differs from traditional helium introduction into metals. A high concentration of helium up to 45 at.% and a uniform distribution in the bulk were shown by ion beam analysis. The process of helium incorporation is considered in which the helium particles are energetically backscattered from the target, fly through the glow discharge zone and are consequently embedded into the growing film. It is virtually a continuous sub-threshold-energy implantation during film deposition based on the plasma technique. The limited partial pressure of argon is to maintain the discharge and sputter the titanium target. The helium content incorporated can be controlled conveniently by adjusting the pressure of the working gases. X-ray diffraction, transmission electron microscopy, Doppler broadening of positron beam analysis and thermal helium desorption spectroscopy revealed the microstructure of titanium films, the state of helium bubbles, the defect characteristic related to helium and thermal release behaviour of helium from the titanium film. |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| 出版者 | IOP PUBLISHING LTD |
| WOS记录号 | WOS:000245301300044 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/126142]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Liu, Chao-Zhuo |
| 作者单位 | 1.Chinese Acad Sci, Inst Phys Met, Shenyang, Peoples R China 2.Fudan Univ, Inst Modern Phys, Shanghai, Peoples R China 3.Chinese Acad Sci, Inst High Energy Phys, Beijing, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Chao-Zhuo,Shi, L. Q.,Zhou, Z. Y.,et al. Investigations of helium incorporated into a film deposited by magnetron sputtering[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2007,40(7):2150-2156. |
| APA | Liu, Chao-Zhuo.,Shi, L. Q..,Zhou, Z. Y..,Hao, X. P..,Wang, B. Y..,...&Wang, L. B..(2007).Investigations of helium incorporated into a film deposited by magnetron sputtering.JOURNAL OF PHYSICS D-APPLIED PHYSICS,40(7),2150-2156. |
| MLA | Liu, Chao-Zhuo,et al."Investigations of helium incorporated into a film deposited by magnetron sputtering".JOURNAL OF PHYSICS D-APPLIED PHYSICS 40.7(2007):2150-2156. |
入库方式： OAI收割
来源：金属研究所
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