Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering
文献类型：期刊论文
| 作者 | Yang Shasha1,2; Yang Feng3; Chen Minghui4; Niu Yunsong1; Zhu Shenglong1; Wang Fuhui4 |
| 刊名 | ACTA METALLURGICA SINICA
 |
| 出版日期 | 2019-03-11 |
| 卷号 | 55期号:3页码:308-316 |
| 关键词 | Ta coating magnetron sputtering nitrogen doping wear |
| ISSN号 | 0412-1961 |
| DOI | 10.11900/0412.1961.2018.00136 |
| 通讯作者 | Chen Minghui(mhchen@mail.neu.edu.cn) |
| 英文摘要 | Tantalum coating attracts increasing attention in heat, corrosion and wear resistant applications today because of its high melting point, immunity to chemical attack and high toughness. Recently, tantalum has been considered a desirable candidate to replace electrodeposited (ED) chromium coating which is often used as protective coating against corrosion and wear. However, the wastes associated with ED chromium contain a well-known carcinogen, i.e. hexavalent chromium, which is a hazard to environment. In comparison, thick Ta coating is regarded as a more environmental and beneficial replacement. Tantalum coating is usually obtained by magnetron sputtering. However, tantalum exhibits two distinct crystalline phases. The body-centered cubic a-phase is the common phase in bulk metal and thermodynamically stable. alpha-Ta with good ductility and excellent mechanical properties is welcomed in most fields. beta-Ta is a metastable phase with tetragonal crystalline lattice structure. The properties of beta-Ta are not as advantageous as alpha-Ta because it is hard and brittle. The existence of beta-Ta may compromise tantalum coating in adhesion, corrosion and wear resistance, hence, finding appropriate deposition conditions to obtain pure alpha-phase Ta coating has attracted a lot of interests. In previous work, pure alpha-phase Ta coating has been deposited by direct current magnetron sputtering when substrates were located in negative glow space. In this work, nitrogen was mixed in sputtering gases to deposit Ta coating with N interstitially dissolved on stainless steel. Effect of N on microstructure, mechanical and tribological performance of Ta coating was studied. Results indicated that when no nitrogen or very low flux of N-2 (l mL/s) were introduced in gas mixtures, alpha-phase Ta coating with coarse grains grew and revealed strong reflections of (211) and (110) diffraction peaks. When N-2 flow rate reached to 5 mL/s, Ta coating with N interstitially dissolved was obtained and revealed grain refinement and (110) preferred orientation of TaN 0.1 phase. Compared to a -phase Ta coating, N-doped tantalum coatings displayed excellent wear resistance for their high hardness and H-3/E-2 ratio (H-hardness, E-elastic modulus). The wear mechanism for alpha-Ta coating was abrasive wear, while that of N-doped Ta coating switched to adhesive wear. |
| WOS研究方向 | Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000457467900002 |
| 出版者 | SCIENCE PRESS |
| 源URL | [http://ir.imr.ac.cn/handle/321006/131562]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Chen Minghui |
| 作者单位 | 1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China 3.Shenyang Ligong Univ, Sch Equipment Engn, Shenyang 110159, Liaoning, Peoples R China 4.Northeastern Univ, Shenyang Natl Key Lab Mat Sci, Shenyang 110819, Liaoning, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yang Shasha,Yang Feng,Chen Minghui,et al. Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering[J]. ACTA METALLURGICA SINICA,2019,55(3):308-316. |
| APA | Yang Shasha,Yang Feng,Chen Minghui,Niu Yunsong,Zhu Shenglong,&Wang Fuhui.(2019).Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering.ACTA METALLURGICA SINICA,55(3),308-316. |
| MLA | Yang Shasha,et al."Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering".ACTA METALLURGICA SINICA 55.3(2019):308-316. |
入库方式： OAI收割
来源：金属研究所
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