Reactive sputter deposition of WO3 films by using two deposition methods
文献类型：期刊论文
| 作者 | Yasuda, Yoji2; Hoshi, Yoichi2; Kobayashi, Shin-ichi2; Uchida, Takayuki2; Sawada, Yutaka2; Wang, Meihan1; Lei, Hao3 |
| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
 |
| 出版日期 | 2019-05-01 |
| 卷号 | 37期号:3页码:6 |
| ISSN号 | 0734-2101 |
| DOI | 10.1116/1.5092863 |
| 通讯作者 | Yasuda, Yoji(yyasuda@em.t-kougei.ac.jp) |
| 英文摘要 | Tungsten-trioxide (WO3) films were deposited using two types of sputtering systems: a planar magnetron sputtering system and a facing-target sputtering (FTS) system. The structure and gasochromic properties of the resulting films were compared, and film uniformity and gasochromic properties were found to be significantly improved when using FTS because the incidence of high-energy negative oxygen ions on the substrate during sputtering was significantly suppressed. The authors confirmed that the deposition rate of WO3 films increased by hundreds of times with an increase of the sputtering voltage from 500 to 800 V in the FTS system, and a deposition rate above 100 nm/min was easily achieved. The authors clarified that the deposition rate of the WO3 film strongly depends on the sputtering voltage under the condition of a constant sputtering current. Published by the AVS. |
| WOS研究方向 | Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000472182400032 |
| 出版者 | A V S AMER INST PHYSICS |
| 源URL | [http://ir.imr.ac.cn/handle/321006/134151]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Yasuda, Yoji |
| 作者单位 | 1.Shenyang Univ, Sch Mech Engn, Shenyang 110044, Liaoning, Peoples R China 2.Tokyo Polytech Univ, 1853 Iiyama, Atsugi, Kanagawa 2430297, Japan 3.Chinese Acad Sci, Inst Met Res, Surface Engn Mat Div, Shenyang 110016, Liaoning, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yasuda, Yoji,Hoshi, Yoichi,Kobayashi, Shin-ichi,et al. Reactive sputter deposition of WO3 films by using two deposition methods[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2019,37(3):6. |
| APA | Yasuda, Yoji.,Hoshi, Yoichi.,Kobayashi, Shin-ichi.,Uchida, Takayuki.,Sawada, Yutaka.,...&Lei, Hao.(2019).Reactive sputter deposition of WO3 films by using two deposition methods.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,37(3),6. |
| MLA | Yasuda, Yoji,et al."Reactive sputter deposition of WO3 films by using two deposition methods".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 37.3(2019):6. |
入库方式： OAI收割
来源：金属研究所
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