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Recent Progress on Topological Structures in Ferroic Thin Films and Heterostructures

文献类型：期刊论文

作者Chen, Shanquan9; Yuan, Shuai9; Hou, Zhipeng1,6,7; Tang, Yunlong8; Zhang, Jinping9; Wang, Tao9; Li, Kang2; Zhao, Weiwei2,9; Liu, Xingjun9; Chen, Lang3
刊名ADVANCED MATERIALS
出版日期2020-08-19
页码24
ISSN号0935-9648
关键词ferroelectrics heterostructures magnetic materials multiferroics thin films topological structures
DOI10.1002/adma.202000857
通讯作者Zhao, Weiwei(wzhao@hit.edu.cn) ; Chen, Zuhuang(zuhuang@hit.edu.cn)
英文摘要Topological spin/polarization structures in ferroic materials continue to draw great attention as a result of their fascinating physical behaviors and promising applications in the field of high-density nonvolatile memories as well as future energy-efficient nanoelectronic and spintronic devices. Such developments have been made, in part, based on recent advances in theoretical calculations, the synthesis of high-quality thin films, and the characterization of their emergent phenomena and exotic phases. Herein, progress over the last decade in the study of topological structures in ferroic thin films and heterostructures is explored, including the observation of topological structures and control of their structures and emergent physical phenomena through epitaxial strain, layer thickness, electric, magnetic fields, etc. First, the evolution of topological spin structures (e.g., magnetic skyrmions) and associated functionalities (e.g., topological Hall effect) in magnetic thin films and heterostructures is discussed. Then, the exotic polar topologies (e.g., domain walls, closure domains, polar vortices, bubble domains, and polar skyrmions) and their emergent physical properties in ferroelectric oxide films and heterostructures are explored. Finally, a brief overview and prospectus of how the field may evolve in the coming years is provided.
资助项目National Natural Science Foundation of China[51972160] ; National Natural Science Foundation of China[51802057] ; National Natural Science Foundation of China[U1932116] ; National Natural Science Foundation of China[51901081] ; National Natural Science Foundation of China[11574091] ; Guangdong Basic and Applied Basic Research Foundation[2020B1515020029] ; Central Military Commission Science and Technology Committee[18-163-00-TS-004-026-01] ; Science and Technology Program of Guangzhou[2019050001] ; Youth Innovation Promotion Association CAS[2016177] ; Shenzhen Science and Technology Program[KQTD20170809110344233] ; Bureau of Industry and Information Technology of Shenzhen through the Graphene Manufacturing Innovation Center[201901161514] ; Science and Technology Research Items of Shenzhen[JCYJ20170412153325679] ; Science and Technology Research Items of Shenzhen[JCYJ20180504165650580] ; High-Level Special Fund[G02206303] ; High-Level Special Fund[G02206403] ; U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division[DE-AC02-05-CH11231] ; U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences[DE-SC-0012375] ; National Science Foundation[OISE-1545907] ; National Science Foundation[DMR-1608938] ; National Science Foundation[DMR-1708615]
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
语种英语
出版者WILEY-V C H VERLAG GMBH
WOS记录号WOS:000560688600001
资助机构National Natural Science Foundation of China ; Guangdong Basic and Applied Basic Research Foundation ; Central Military Commission Science and Technology Committee ; Science and Technology Program of Guangzhou ; Youth Innovation Promotion Association CAS ; Shenzhen Science and Technology Program ; Bureau of Industry and Information Technology of Shenzhen through the Graphene Manufacturing Innovation Center ; Science and Technology Research Items of Shenzhen ; High-Level Special Fund ; U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division ; U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences ; National Science Foundation
源URL[http://ir.imr.ac.cn/handle/321006/140359]  
专题金属研究所_中国科学院金属研究所
通讯作者Zhao, Weiwei; Chen, Zuhuang
作者单位1.South China Normal Univ, Natl Ctr Int Res Green Optoelect, Guangzhou 510006, Peoples R China
2.Harbin Inst Technol, Flexible Printed Elect Technol Ctr, Shenzhen 518055, Peoples R China
3.Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
4.Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
5.Lawrence Berkeley Natl Lab, Mat Sci Div, Berkeley, CA 94720 USA
6.South China Normal Univ, South China Acad Adv Optoelect, Guangdong Prov Key Lab Opt Informat Mat & Technol, Guangzhou 510006, Peoples R China
7.South China Normal Univ, South China Acad Adv Optoelect, Inst Adv Mat, Guangzhou 510006, Peoples R China
8.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Wenhua Rd 72, Shenyang 110016, Peoples R China
9.Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Peoples R China
推荐引用方式
GB/T 7714		 Chen, Shanquan,Yuan, Shuai,Hou, Zhipeng,et al. Recent Progress on Topological Structures in Ferroic Thin Films and Heterostructures[J]. ADVANCED MATERIALS,2020:24.
APA Chen, Shanquan.,Yuan, Shuai.,Hou, Zhipeng.,Tang, Yunlong.,Zhang, Jinping.,...&Chen, Zuhuang.(2020).Recent Progress on Topological Structures in Ferroic Thin Films and Heterostructures.ADVANCED MATERIALS,24.
MLA Chen, Shanquan,et al."Recent Progress on Topological Structures in Ferroic Thin Films and Heterostructures".ADVANCED MATERIALS (2020):24.

入库方式： OAI收割

来源：金属研究所

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