中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of modulation ratio on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering

文献类型:期刊论文

作者Liu, Yanming2; Tian, Li2; Chang, Jianxiu2; An, Minrong2; Pei, Zhiliang1; Fan, Di1
刊名JOURNAL OF ALLOYS AND COMPOUNDS
出版日期2021-01-15
卷号851页码:10
关键词Magnetron sputtering WB2/CrN multilayers Modulation ratio Mechanical properties
ISSN号0925-8388
DOI10.1016/j.jallcom.2020.156852
通讯作者Pei, Zhiliang(zlpei@imr.ac.cn) ; Fan, Di(dfan11s@alum.imr.ac.cn)
英文摘要WB2/CrN multilayer films with thick modulation period about 500 nm but different modulation ratios (t(W)(B2):t(CrN) = 1.2, 2, 3 and 4) were deposited on steel substrates by magnetron sputtering, and the effect of modulation ratio on the structure, residual stress and tribo-mechanical properties of the WB2/CrN multilayer films was systematically studied. Additionally, WB2 and CrN monolayer films with various thicknesses were also prepared to discuss the growth behavior and the related properties of the WB2/CrN multilayer films. All the sample films present the columnar growth, and the particle size in the WB2 monolayers is smaller than that in the corresponding WB2 sublayers. The preferred orientation of WB2 (260-400nm) and CrN monolayers (132-220 nm) is (101) and (111), respectively. However, the multilayered structure changes the orientation of CrN sublayers to (002), and crystalline Cr2N phase is detected in WB2/CrN multilayers caused by the element diffusion at interface. Moreover, the multilayered structure reduces the compressive stress of the WB2 films greatly by diffusion of point defects to interfaces and an indirect effect of interfaces on stress via film structure with soft CrN, and the residual stress of the WB2, CrN and WB2/CrN films is -2.64 similar to-4.16, -0.85-0.57 and -1.49 similar to-2.61 GPa, respectively. Furthermore, film hardness ranging from 27.9 to 33.0 GPa mainly obeys the rule of mixture. The adhesive strength drops greatly from 26 to 17 N with the increasing t(W)(B2):t(CrN), and the tensile CrN bottom-layer deteriorates the adhesive strength of the WB2/CrN multilayers with t(W)(B2):t(CrN) = 2. Overall, WB2/CrN films with t(W)(B2):t(CrN) = 3 show better wear resistance with lower friction coefficient similar to 0.35 and wear rate about 3.6 x 10(-7) mm(3)/mN benefiting from their higher hardness, lower roughness, proper toughness and compressive stress. (C) 2020 Elsevier B.V. All rights reserved.
资助项目Natural Science Foundation of China[51701157] ; Innovation Team Funding by Xi'an Shiyou University[2019QNKYCXTD12] ; National Science and Technology Major Project[2017-VI-0019-0019] ; Natural Science Foundation of Shaanxi Province of China[2018JQ5198] ; Scientific Research Program - Shaanxi Provincial Education Department[19JK0672]
WOS研究方向Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering
语种英语
WOS记录号WOS:000579868900083
出版者ELSEVIER SCIENCE SA
资助机构Natural Science Foundation of China ; Innovation Team Funding by Xi'an Shiyou University ; National Science and Technology Major Project ; Natural Science Foundation of Shaanxi Province of China ; Scientific Research Program - Shaanxi Provincial Education Department
源URL[http://ir.imr.ac.cn/handle/321006/141127]  
专题金属研究所_中国科学院金属研究所
通讯作者Pei, Zhiliang; Fan, Di
作者单位1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
2.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Peoples R China
推荐引用方式
GB/T 7714
Liu, Yanming,Tian, Li,Chang, Jianxiu,et al. Effect of modulation ratio on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2021,851:10.
APA Liu, Yanming,Tian, Li,Chang, Jianxiu,An, Minrong,Pei, Zhiliang,&Fan, Di.(2021).Effect of modulation ratio on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering.JOURNAL OF ALLOYS AND COMPOUNDS,851,10.
MLA Liu, Yanming,et al."Effect of modulation ratio on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering".JOURNAL OF ALLOYS AND COMPOUNDS 851(2021):10.

入库方式: OAI收割

来源:金属研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。