中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters

文献类型:期刊论文

作者Wu FaYu2; Li JianWei2; Qi Yi3; Ding WuTong1; Guo YuanYuan2; Zhou YanWen2
刊名ACTA METALLURGICA SINICA-ENGLISH LETTERS
出版日期2016
卷号29期号:9页码:827-833
关键词CONDUCTIVE OXIDE-FILMS THIN-FILMS TRANSPARENT ZnSnO3 film Powder target Magnetron sputtering Optical property Electrical property
ISSN号1006-7191
其他题名Characteristics of the Structure and Properties of ZnSnO_3 Films by Varying the Magnetron Sputtering Parameters
英文摘要Transparent conductive oxide ZnSnO3 films were prepared by radio-frequency magnetron sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy, atomic force microscopy, surface profile, UV-Vis spectroscopy, and Hall effect. The structures of the films were either amorphous or nanocrystalline depending on sputtering parameters including deposition time, target power, chamber pressure, and the target substrate separation. The average transmittance of the ZnSnO3 films within the visible wavelength was approximately 80% and the resistivity of the ZnSnO3 films was in the range of 10(-3)-10(-4) Omega cm. The structural, optical, and electrical properties of the ZnSnO3 films could be adjusted and regulated by optimizing the sputtering process, allowing materials with specific properties to be designed.
资助项目[National Natural Science Foundation of China] ; [Foundation of Educational Department of Liaoning] ; [Open Subject of Key Laboratory Liaoning Province]
语种英语
CSCD记录号CSCD:5804835
源URL[http://ir.imr.ac.cn/handle/321006/142321]  
专题金属研究所_中国科学院金属研究所
作者单位1.中国科学院金属研究所
2.Univ Sci & Technol Liaoning, Sch Met & Materials, Laser Adv Mfg Technol Ctr, Anshan 114051, Peoples R China
3.SINOTRUK Hong Kong Ltd, Jinan Casting & Forging Ctr, Zhangqiu 250200, Peoples R China
推荐引用方式
GB/T 7714
Wu FaYu,Li JianWei,Qi Yi,et al. Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2016,29(9):827-833.
APA Wu FaYu,Li JianWei,Qi Yi,Ding WuTong,Guo YuanYuan,&Zhou YanWen.(2016).Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters.ACTA METALLURGICA SINICA-ENGLISH LETTERS,29(9),827-833.
MLA Wu FaYu,et al."Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters".ACTA METALLURGICA SINICA-ENGLISH LETTERS 29.9(2016):827-833.

入库方式: OAI收割

来源:金属研究所

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