The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition
文献类型：期刊论文
| 作者 | Zhang Jian; Ba DeChun; Zhao ChongLing; Liu Kun; Du GuangYu |
| 刊名 | ACTA PHYSICA SINICA
 |
| 出版日期 | 2015 |
| 卷号 | 64期号:6 |
| 关键词 | SILICON-NITRIDE FILMS THIN-FILMS PLASMA PHOTOLUMINESCENCE TEMPERATURE SiNx thin film linear microwave chemical vapor deposition refractivity deposition rate |
| ISSN号 | 1000-3290 |
| 其他题名 | The microstructure and optical properties of SiN_x deposited by linear microwave chemical vapor deposition |
| 英文摘要 | SiNx films are synthesized on Si substrates in a home-made linear microwave plasma enhanced chemical vapor deposition system at different microwave powers, duty cycles, substrate temperatures, and ratios of silane (SiH4) flow to ammonia (NH3) gas flow. The effects of technological parameters on morphology of film surface, stoichiometric proportion, refractive index and deposition rate of SiNx film are characterized by scanning electron microscopy (SEM) and elliptical polarization instrument, and the relationships among stoichiometric proportion, refractive index and deposition rate are investigated. The results from SEM analysis indicate that the surfaces are smooth and the elements are homogeneously distributed in the films obtained under different deposition parameters. The ratio of SiH4 flow to NH3 gas flow and the duty cycle are the most critical factors determining the refractive index which can be changed from 1.92 to 2.33. The thickness measurements show that the deposition rate of SiNx film is affected by microwave power, duty cycle, substrate temperature and flow ratio. The maximum deposition rate achieved in the paper is 135 nm.min(-1). |
| 资助项目 | [Doctoral Fund of Ministry of Education of China] |
| 语种 | 英语 |
| CSCD记录号 | CSCD:5381201 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/145495]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 作者单位 | 中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Zhang Jian,Ba DeChun,Zhao ChongLing,et al. The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition[J]. ACTA PHYSICA SINICA,2015,64(6). |
| APA | Zhang Jian,Ba DeChun,Zhao ChongLing,Liu Kun,&Du GuangYu.(2015).The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition.ACTA PHYSICA SINICA,64(6). |
| MLA | Zhang Jian,et al."The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition".ACTA PHYSICA SINICA 64.6(2015). |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。