Investigation of TiN film on an RF ceramic window by atomic layer deposition
文献类型：期刊论文
| 作者 | Peng, Zhen2,3; Chen, Gen2 ; Zhao, Yan-Ping2; Zhang, Xin2; Song, Yun-Tao2,3; Shirkov, Grigori1; Karamysheva, Galina1; Karamyshev, Oleg1; Calabretta, Luciano4; Caruso, Antonio4
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| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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| 出版日期 | 2020-09-01 |
| 卷号 | 38 |
| ISSN号 | 0734-2101 |
| DOI | 10.1116/6.0000159 |
| 通讯作者 | Chen, Gen(chengen@ipp.ac.cn) |
| 英文摘要 | To reduce the secondary emission yield of an RF window ceramic so as to suppress the occurrence of a multipactor, we propose coating the window with a titanium nitride (TiN) film by atomic layer deposition. We investigate two groups of samples with film thicknesses of 56 and 8 nm, respectively, to analyze the composition and optimize the coating thickness of the TiN film on the ceramic. For the first group of samples (56 nm films), x-ray photoelectron spectroscopy (XPS) results show that the film can be divided into three mixed layers: a top layer composed of TiOxNy and TiO2; a middle layer consisting of TiN, TiOxNy, TiO2, and TiC; and a bottom layer called a diffusion layer, formed by decreasing TiN, TiOxNy, TiO2, TiC, and increasing Al2O3 as the ceramic is approached. The depth of this bottom layer is similar to 8 nm. Two more films (8 nm films) in the second group of samples were grown on a 96 ceramic and silicon to determine the sheet resistance, those on silicon is similar to 1 k Omega/square as measured by spectroscopic ellipsometry. According to the XPS results of the two 8 nm films, the content of TiOxNy and TiO2 increased while TiN content decreased in the film on 96 ceramic, compared to the film on silicon. Therefore, the 8 nm film is suitable for use as a coating for the RF window to weaken the multipactor effect and lower conductivity. To test the film performance, an RF ceramic window is coated with an 8 nm TiN film. Low-power measurements show that, within a frequency of 100 MHz, the 8 nm film on the RF ceramic window has a negligible effect on its transmission characteristics. 8 kW RF power tests indicate that the film coating can significantly improve the power transmission, anti-multipaction, and stability of the RF window. |
| WOS关键词 | RAY PHOTOELECTRON-SPECTROSCOPY ; TITANIUM NITRIDE ; COATINGS |
| 资助项目 | China Fusion Engineering Experimental Reactor General Integration and Engineering Design[2017YFE0300503] ; National Natural Science Foundation of China (NNSFC)[11775258] |
| WOS研究方向 | Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000642010400001 |
| 出版者 | A V S AMER INST PHYSICS |
| 资助机构 | China Fusion Engineering Experimental Reactor General Integration and Engineering Design ; National Natural Science Foundation of China (NNSFC) |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/122360]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 通讯作者 | Chen, Gen |
| 作者单位 | 1.Joint Inst Nucl Res, Dubna 141980, Russia 2.Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China 3.Univ Sci & Technol China, Hefei 230026, Peoples R China 4.Southern Natl Labs, Natl Inst Nucl Phys, I-95123 Catania, Italy |
| 推荐引用方式 GB/T 7714 | Peng, Zhen,Chen, Gen,Zhao, Yan-Ping,et al. Investigation of TiN film on an RF ceramic window by atomic layer deposition[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2020,38. |
| APA | Peng, Zhen.,Chen, Gen.,Zhao, Yan-Ping.,Zhang, Xin.,Song, Yun-Tao.,...&Caruso, Antonio.(2020).Investigation of TiN film on an RF ceramic window by atomic layer deposition.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,38. |
| MLA | Peng, Zhen,et al."Investigation of TiN film on an RF ceramic window by atomic layer deposition".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 38(2020). |
入库方式： OAI收割
来源：合肥物质科学研究院
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