Particle flux characteristics of a compact high-field cascaded arc plasma device
文献类型：期刊论文
| 作者 | YUAN,Xiaogang1,2; ZHOU,Haishan1,2 ; LIU,Haodong1; LI,Bo1,2; WANG,Yong1; CHANG,Lei1,2; YANG,Xin1; WANG,Chuang1; ZHANG,Lupeng1,2; LUO,Guangnan1,2
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| 刊名 | Plasma Science and Technology
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| 出版日期 | 2021-09-24 |
| 卷号 | 23 |
| ISSN号 | 1009-0630 |
| 关键词 | cascaded arc plasma plasma-wall interaction ion flux vacuum design linear plasma device |
| DOI | 10.1088/2058-6272/ac1fd8 |
| 通讯作者 | ZHOU,Haishan() |
| 英文摘要 | Abstract A new compact cascaded arc device for plasma-wall interaction study is developed at the Institute of Plasma Physics, Chinese Academy of Sciences. A magnetic field up to 0.8 T is achieved to confine plasmas in a 1.2 m long and 0.1 m diameter vacuum chamber. Gas fluid type analysis in this compact vacuum system was done under high particle flux condition. The gas pressure obtained by calculation was consistent with the measurement result. Continuous argon plasma discharge with ion flux of ～0.5?×?1024 m?2 s?1 is successfully sustained for more than 1 h. The effects of magnetic field configuration, gas flow rate, and discharge arc current on the ion flux to target were studied in detail. |
| 语种 | 英语 |
| 出版者 | IOP Publishing |
| WOS记录号 | IOP:1009-0630-23-11-AC1FD8 |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/125387]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 通讯作者 | ZHOU,Haishan |
| 作者单位 | 1.Institute of Plasma Physics, HFIPS, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China 2.University of Science and Technology of China, Hefei 230026, People’s Republic of China |
| 推荐引用方式 GB/T 7714 | YUAN,Xiaogang,ZHOU,Haishan,LIU,Haodong,et al. Particle flux characteristics of a compact high-field cascaded arc plasma device[J]. Plasma Science and Technology,2021,23. |
| APA | YUAN,Xiaogang.,ZHOU,Haishan.,LIU,Haodong.,LI,Bo.,WANG,Yong.,...&LUO,Guangnan.(2021).Particle flux characteristics of a compact high-field cascaded arc plasma device.Plasma Science and Technology,23. |
| MLA | YUAN,Xiaogang,et al."Particle flux characteristics of a compact high-field cascaded arc plasma device".Plasma Science and Technology 23(2021). |
入库方式： OAI收割
来源：合肥物质科学研究院
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